Containing more than 300 equations and nearly 500 drawings, photographs, and micrographs,
this reference surveys key areas such as optical measurements and in-line calibration methods. It describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay, acoustic film thickness, dopant dose, junction depth, and electrical measurements; particle and defect detection; and flatness following chemical mechanical polishing. Providing examples of well-developed metrology capability, the book focuses on metrology for lithography, transistor, capacitor, and on-chip interconnect process technologies.
"…recommended for special libraries and academic libraries serving graduate level programs in these areas."
"…a cornerstone reference source….uniquely ample and thorough."
"…a formative instrument. …contains valuable and very new information … an instructive and valuable book."
-IASI Polytechnic Magazine