Handbook of Thin Film Process Technology, CD-ROM: 1st Edition (CD-ROM) book cover

Handbook of Thin Film Process Technology, CD-ROM

1st Edition

Edited by D Glocker, S Shah

CRC Press

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CD-ROM: 9780750304092
pub: 1997-01-01
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Description

The Handbook of Thin Film Process Technology, CD-ROM reproduces the text version in its entirety, including illustrations and references from the print edition. With full printing functionality, the CD has all of the added benefits associated with CD-ROM technology, such as easy searching and browsing and hypertext linking and bookmarking,. As a bonus, the CD-ROM also contains both 1996 supplements. Some of the other features include:

  • Compatibility with Macintosh and Windows platforms

  • Simple and Boolean searching

  • Intuitive push button data navigation through the Acrobat interface

  • True page image replication on the computer screen

  • Page zoom enlargement and reduction

  • Word Stemming and Word Proximity searching

  • Thesaurus searching

  • Searchable on-line users guide
  • Table of Contents

    PHYSICAL DEPOSITION TECHNIQUES

    Thermal Evaporation (Coordinating Editors: E.B. Graper and J. Vossen)

    Introduction and general discussion (E.B. Graper)

    Resistance evaporation (E.B. Graper)

    Electron beam evaporation (E.B. Graper)

    Ion vapor evaporation (E.B. Graper)

    Cathodic arc deposition (P.J. Martin)

    Laser ablation (A. Morimoto and T. Shimizu)

    Molecular Beam Epitaxy (Coordinating Editors: S.A. Barnett and J. Poate)

    Introduction and general discussion (S.A. Barnett and I.T. Ferguson)

    Semiconductor growth by metalorganic molecular beam epitaxy (MOMBE) (C.R. Abernathy)

    Gas-source MBE (G.Y. Robinson)

    Chemical beam epitaxy (T.H. Chiu)

    Thin film deposition and dopant incorporation by energetic particle sources (S. Strite and H. Morkoc)

    Sputtering (Coordinating Editors: S.I. Shah and D. Glocker)

    Introduction and general discussion (S.I. Shah)

    Glow discharge sputtering (A.S. Penfold)

    Magneton sputtering (A.S. Penfold)

    Ion-beam sputtering (T. Itoh)

    Thermal Spraying (Coordinating Editor: R.C. Tucker Jr.)

    Introduction to thermal spray coatings (R.C. Tucker Jr.)

    Flame spray (P.A. Kammer)

    Plasma spray coatings (R.C. Tucker Jr.)

    High velocity oxy-fuel coatings (R.C. Tucker Jr.)

    Detonation gun deposition (R.C. Tucker Jr.)

    Mechanical, wear, corrosion, and other properties of thermal spray coatings (R.C. Tucker Jr.)

    CHEMICAL DEPOSITION TECHNIQUES

    Chemical Vapor Deposition (Coordinating Editor: L. Vescan)

    Introduction and general discussion (L. Vescan)

    Metalorganic chemical vapour deposition (MOCVD) (R.D. Dupuis)

    Photoassisted chemical vapour deposition (S.J.C. Irvine)

    Thermally activated chemical vapour deposition (L. Vescan)

    Atomic layer epitaxy (T. Suntola)

    PROCESSING TECHNOLOGIES

    Pattern Transfer (Coordinating Editor: J.W. Coburn

    Introduction and general discussion (J.W. Coburn)

    Reactive ion etching (C. Steinbruchel)

    Ion-beam-based chemical dry etching (C. Steinbruchel)

    Ion milling (C. Steinbruchel)

    REAL-TIME DIAGNOSTICS

    Introduction and General Discussion (Coordinating Editor: R.W. Collins)

    Diagnostic Techniques

    Reflection high-energy electron diffraction as a diagnostic technique (B.A. Joyce)

    Low-energy electron diffraction (Sheng-Liang Chang and P.A. Thiel)

    Reflection mass spectroscopy (R. Kaspi)

    Optical Diagnostics

    Infrared emission interferometry (A.J. Springthorpe)

    Reflectance anisotropy (B. Drevillon)

    Interferometry as an in situ probe during processing of semiconductor wafers (V.M. Donnelly)

    Ellipsometry (P. Snyder)

    Photoluminescence (P.R. Berger)

    Elastic laser light scattering (B. Gallois)

    Plasma Probes

    Langmuir probe diagnostics (N. Hershkowitz)

    Microwave interferometers (R.A. Breun)

    Atomic absorption spectroscopy (Chih-shun Lu)

    Other Diagnostics (Coordinating Editor: R. Collins)

    Quartz monitors and microbalances (J. Krim and C. Daly)

    Probes of film stress (D. Glocker)

    SURFACE MODIFICATION IN VACUUM

    Processes for Substrate Cleaning (D. Mattox)

    Surface Treatment for Corrosion and Wear Protection

    Material aspects of corrosion protection (Cathy Cotell)

    Ion implantation with beams (Mike Nastasi)

    Plasma source ion implantation (Donald Rej)

    Surface Treatment of Polymers for Adhesion

    Plasma sources for polymer surface treatment (M.R. Wertheimer and Edward Liston)

    Surface chemistry of treated polymers (Lou Gerenser)

    MATERIALS

    Hard and Protective Materials

    Introduction (O. Knotek and A. Schrey)

    TiN

    TiAIN

    TiAIVN

    CrN

    ZrN

    HfN

    BN

    Diamond

    Ni-Cr-B-Si

    Al-bronze

    Al2O3-TiO2

    Electronic Materials

    Introduction (K. Cadien and S. Sivaram)

    GaAs

    a-Si:H

    AlGaAs

    Tellurides

    CuInSe2

    Si

    Ge

    Si-Ge

    W

    GaN

    AIN

    ErAs

    Quaternaries

    Silicides

    SiSnC

    SiN

    Optical Materials

    Introduction (J. Targove)

    AIN

    ZnO

    PbTiO3

    KNbO3

    Ferroelectric Materials

    Introduction (M. Sayer)

    Bi4Ti3O12

    LiNbO3 and LiTaO3

    PbTiO3/PbZrTiO3

    Ferromagnetic Materials

    Introduction (E.M.T. Velu and D.N. Lambeth)

    CoCr

    TbFeCo

    CoPt/CoPd

    GdTbFe

    Superconducting Materials

    Introduction (J. Azoulay)

    NbN

    YBa2Cu3O7

    Thallium-based compounds

    Mercury-based compounds

    Miscellaneous Materials

    PTFE

    PPN

    Ir/Pt

    Appendix A: List of Contributors

    Subject Index

    Subject Categories

    BISAC Subject Codes/Headings:
    SCI077000
    SCIENCE / Solid State Physics
    TEC021000
    TECHNOLOGY & ENGINEERING / Material Science