1st Edition

Industrial Plasma Engineering
Volume 2 - Applications to Nonthermal Plasma Processing

ISBN 9780750305457
Published August 25, 2001 by CRC Press
660 Pages

USD $105.00

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Book Description

Written by a leading expert in the field, the paperback edition of Industrial Plasma Engineering, Volume 2: Applications to Nonthermal Plasma Processing provides a background in the principles and applications of low temperature, partially ionized Lorentzian plasmas that are used industrially. The book also presents a description of plasma-related processes and devices that are of commercial interest. The text is suitable for students or in-service users with a physics and calculus background at the sophomore level. These two volumes are intended to be used as textbooks at the senior or first-year graduate level by students from all engineering and physical science disciplines and as a reference source by in-service engineers.

Table of Contents

Surface Interactions in Plasma Processing
Atmospheric Pressure Plasma Sources
Vacuum Plasma Sources
Plasma Reactors for Plasma Processing
Specialized Techniques and Devices for Plasma Processing
Parametric Plasma Effects on Plasma Processing
Diagnostics for Plasma Processing
Plasma Treatment of Surfaces
Surface Modification by Implantation and Diffusion
Thin Film Deposition by Evaporative Condensation and Sputtering
Plasma Chemical Vapor Deposition (PCVD)
Plasma Etching

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