This reference focuses on the current state of fundamental research and industrial achievements in the field of precision laser processing of a wide range of metal, semiconductor and dielectric materials. The possibilities of microprocessing by pulsed nanosecond laser radiation and copper vapor laser systems are analyzed. Design and operation principles, ways to increase their efficiency and reliability, and a series of modern automated technological installations are described. The work will be of interest to specialists, engineers, students and graduate students working and studying in the field of laser technology and optics, laser and information technology.
Introduction. Overview of the current state and development of pulsed copper vapor laser (CVL) and copper vapor laser processing systems (CVLPS). Possibilities of pulsed CVL and CVLPS for microprocessing of materials. A new generation of high-performance and durable industrial sealed active element pulsed CVL of the series "Coulomb" with a radiation power of 1-20 W and "Crystal" with a power of 30-100 W. Highly selective optical systems for the formation in CVL and CVLPS of single-beam radiation of diffraction quality and with stable parameters. Industrial technological CVL and CVLPS on the basis of a new generation of sealed active elements and new optical systems. Advanced Caravel automatic laser processing systems. Laser technologies of precision microprocessing of foil and thin sheet materials for electronic components. The use of industrial automatic laser processing systems "Caravel-1", "Caravel-1M", "Caravel-2" and "Caravel-2M" for the manufacture of precision parts of electronic components.