Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science.
The book comprises four parts. Part 1 describes the fundamental difference between glow discharge of an inert gas and that of an organic vapor, from which the concepts of Luminous Gas Phase derive. Part 2 explores the various ways of practicing Luminous Vapor Disposition and Treatment depending on the type and nature of substrates. Part 3 covers some very important aspects of surface and interface that could not have been seen clearly without results obtained by application of LCVD. Part 4 offers some examples of interface engineering that show very unique aspects of LCVD interface engineering in composite materials, biomaterial surface and corrosion protection by the environmentally benign process.
Timely and up-to-date, the book provides broad coverage of the complex relationships involved in the interface between a gas/solid, liquid/solid, and a solid/solid. The author presents a new perspective on low-pressure plasma and describes key aspects of the surface and interface that could not be shown without the results obtained by LCVD technologies.
About the author:
Dr. Yasuda is one of the pioneers who explored low-pressure plasma for surface modification of materials and deposition of nano films as barrier and perm-selective membranes in the late 1960s. He obtained his PhD in physical and polymer chemistry working on transport properties of gases and vapors in polymers at State University of New York, College of Environmental Science and Forestry at Syracuse, NY. He has over 300 publications in refereed journals and books, and is currently a Professor Emeritus of Chemical Engineering, and Director, Center for Surface Science & Plasma Technology, University of Missouri-Columbia, and is actively engaged in research on the subjects covered by this book.
"Provides an excellent introduction to the field of plasma polymerization. …The book is lucid and well-organized, with great attention paid to depth and breadth of coverage. What is particularly impressive is the effort put into making the topic of LCVD accessible to researchers outside the field. …This book should prove quite helpful to anyone doing LCVD or interested in evaluating the applicability of this method to their systems."
-Polymer News, Vince Rotello, University of Massachusetts, Amherst, USA
"This new book is the most comprehensive treatment of the subject ever published and represents both significant advances in depth of presentation and breath of coverage as compared to the 1985 book by the same author."
-Journal Of Surfactants and Detergents, Vol. 9, 2006
FUNDAMENTALS OF LUMINOUS CHEMICAL VAPOR DEPOSITION
Domain of LCVD
Luminous Gas Phase
Creation of Chemically Reactive Species in LCVD
Growth and Deposition Mechanisms
Chemical Structures of Organic Compounds for LCVD
Ablation by Luminous Gas (Low Pressure Plasma)
Competitive Ablation and Polymerization
Internal Stress in Material Formed by LCVD
OPERATION OF LUMINOUS CHEMICAL VAPOR DEPOSITION AND TREATMENT
Modes of Operation and Scale-Up Principle
CD & Alternating Current Discharge
Anode Magnetron Discharge
Low-Pressure Cascade Arc Torch (LPCAT)
Anode Magetron Torch
Primary, Secondary, and Pulsed Discharges
Composition Graded Transition Phase
FUNDAMENTALS OF SURFACE AND INTERFACE
Contact Angle and Wettability
Sessile Bubble Formation and Detachment
Principle for Interface Egnineering
Creation of Imperturbable Surface
Creating Adhesion to Substrate Surfaces
Corrosion Protection of Aluminum Alloys
Corrosion of Ion Vapor Deposited (IVD) Aluminum
Corrosion Protection of Cold Rolled Steel and Pure Iron
Membrane Preparation and Modification
Application of LCVD in Biomaterials
Economical Advantages of LCVD