Materials Processing by Cluster Ion Beams: History, Technology, and Applications, 1st Edition (Hardback) book cover

Materials Processing by Cluster Ion Beams

History, Technology, and Applications, 1st Edition

By Isao Yamada

CRC Press

260 pages | 168 B/W Illus.

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pub: 2015-08-20
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Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing.

Written by the originator of the gas cluster ion beam (GCIB) concept, this book:

  • Offers an overview of ion beam technologies, from the discovery of monomer ions to the introduction of GCIBs
  • Explores the development of sources for producing cluster beams from solid materials
  • Describes the engineering characteristics of gas cluster ion beam equipment
  • Covers cluster ion-solid surface interaction kinetics as well as sputtering, implantation, and ion-assisted deposition
  • Details surface processing techniques for smoothing, shallow implantation, and preparation of high-quality thin films
  • Introduces representative examples of emerging GCIB industrial applications

Materials Processing by Cluster Ion Beams: History, Technology, and Applications provides a deeper understanding of the importance of cluster ion beams and their applications.

Table of Contents




Ion Beam Technology: Overview and History




History and Milestones of Cluster Beam Development

Cluster Beam Discovery and Early Fundamental Progress

Development of Gas Cluster Beam Equipment

Precursor Technology

Origination of Gas Cluster Ion Beam Technology

Development of Gas Cluster Ion Beam Processing

Development of Polyatomic Ion Beam Processing


Development of Cluster Beam Sources for Solid Materials

Gas Condensation and Aggregation Sources

Pure Expansion Source

Arc Vaporization Sources

Laser Irradiation Sources

Ion and Plasma Sputtering Sources

Polyatomic Sources


Gas Cluster Ion Beam Equipment

Gas Cluster Ion Beam Equipment for Process Applications

Generation of Gas Cluster Beams

Ionization of Gas Cluster Beams

Electron Energy Dependence

Cluster Size Dependence

Ionization Efficiency Dependence

Cluster Size Distributions

Beam Transport Characteristics of Cluster Ion Beams


Cluster Ion-Solid Surface Interaction Kinetics

Gas Cluster Ion Beams

Polyatomic Ion Beams


Cluster Ion Beam Sputtering

Lateral Sputtering

Physical Sputtering

Reactive Sputtering

Surface Smoothing


Cluster Ion Implantation

Gas Cluster Ion Implantation: Infusion Doping Process

Polyatomic Cluster Ion Implantation


Cluster Ion Beam-Assisted Deposition

Oxide Films

Diamondlike Carbon Films



Nanoscale Etching and Smoothing for Optical and Magnetic Devices

Highly Anisotropic Etching Processing

Semiconductor Device Fabrication

GCIB Infusion Doping

Polyatomic Cluster Ion Doping

Analytical Instrumentation Applications

Biomaterial Applications

GCIB Processing for Biomaterial Applications

ANAB Processing for Biomaterial Applications




About the Author

Isao Yamada was the originator of the concept for the processing of materials by gas cluster ion beams. He is presently a visiting professor at the Graduate School of Engineering of the University of Hyogo in Japan. He is professor emeritus at Kyoto University, where he was director of the Ion Beam Engineering Experimental Laboratory. He received his Ph.D in electrical engineering from Kyoto University and has held visiting scientist appointments at the FOM Institute in Amsterdam, the Massachusetts Institute of Technology, Cornell University, and Northwestern University. For the past 40 years, his principal areas of research have ranged from fundamental physics to practical applications of materials processing by ion beams, with particular emphasis on very low-energy ion-solid interactions.

Subject Categories

BISAC Subject Codes/Headings:
SCIENCE / Solid State Physics
TECHNOLOGY & ENGINEERING / Electronics / General