Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology: 1st Edition (Hardback) book cover

Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology

1st Edition

By Saburo Nonogaki, Ueno Takumi, Toshio Ito

CRC Press

336 pages

Purchasing Options:$ = USD
Hardback: 9780824799519
pub: 1998-06-25
$255.00
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Description

"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."

Table of Contents

Exposure systems in photolithography; optical pattern transfer; chemistry of photoresist materials; practical processes in microlithography; X-ray lithography; electron-beam lithography; variations in microlithographic process.

Subject Categories

BISAC Subject Codes/Headings:
TEC008000
TECHNOLOGY & ENGINEERING / Electronics / General
TEC027000
TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS