Microlithography : Science and Technology, Second Edition book cover
2nd Edition

Science and Technology, Second Edition

ISBN 9780824790240
Published May 11, 2007 by CRC Press
864 Pages 541 B/W Illustrations

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Book Description

This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.

New in the Second Edition
In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including:

  • Immersion Lithography
  • 157nm Lithography
  • Electron Projection Lithography (EPL)
  • Extreme Ultraviolet (EUV) Lithography
  • Imprint Lithography
  • Photoresists for 193nm and Immersion Lithography
  • Scatterometry

Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Table of Contents

System Overview of Optical Steppers and Scanners; Michael S. Hibbs
Optical Lithography Modeling; Chris A. Mack
Optics for Photolithography; Bruce W. Smith
Excimer Laser for Advanced Microlithography; Palash Das
Alignment and Overlay; Gregg M. Gallatin
Electron Beam Lithography System; Kazuaki Suzuki
X-Ray Lithography; Takumi Ueno
EUV Lithography; Stefan Wurm and Charles Gwyn
Imprint Lithography; Douglas J. Resnick
Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen
Resist Processing; Bruce W. Smith
Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty
Dry Etching of Photoresists; Roderick R. Kunz
Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur
Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar

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Praise for the First Edition

"…The editors have done an excellent job of gathering the knowledge of a number of world experts and blending it into a harmonious whole which will serve as a reference for some time to come, even in this fast-moving field."
—International Journal of Electrical Engineering Education