Microlithography: Science and Technology, Second Edition, 2nd Edition (Hardback) book cover

Microlithography

Science and Technology, Second Edition, 2nd Edition

Edited by Bruce W. Smith, Kazuaki Suzuki

CRC Press

864 pages | 541 B/W Illus.

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Hardback: 9780824790240
pub: 2007-05-11
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pub: 2007-05-11
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Description

This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.

New in the Second Edition

In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including:

  • Immersion Lithography
  • 157nm Lithography
  • Electron Projection Lithography (EPL)
  • Extreme Ultraviolet (EUV) Lithography
  • Imprint Lithography
  • Photoresists for 193nm and Immersion Lithography
  • Scatterometry

Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Reviews

Praise for the First Edition

"…The editors have done an excellent job of gathering the knowledge of a number of world experts and blending it into a harmonious whole which will serve as a reference for some time to come, even in this fast-moving field."

—International Journal of Electrical Engineering Education

Table of Contents

EXPOSURE SYSTEM

System Overview of Optical Steppers and Scanners; Michael S. Hibbs

Optical Lithography Modeling; Chris A. Mack

Optics for Photolithography; Bruce W. Smith

Excimer Laser for Advanced Microlithography; Palash Das

Alignment and Overlay; Gregg M. Gallatin

Electron Beam Lithography System; Kazuaki Suzuki

X-Ray Lithography; Takumi Ueno

EUV Lithography; Stefan Wurm and Charles Gwyn

Imprint Lithography; Douglas J. Resnick

RESISTS AND PROCESSING

Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen

Resist Processing; Bruce W. Smith

Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty

Dry Etching of Photoresists; Roderick R. Kunz

METROLOGY AND NANOLITHOGRAPHY

Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur

Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar

Index

Subject Categories

BISAC Subject Codes/Headings:
TEC008070
TECHNOLOGY & ENGINEERING / Electronics / Microelectronics
TEC019000
TECHNOLOGY & ENGINEERING / Lasers & Photonics