Nanocomposite materials as a special class of nanostructured materials have recently attracted great interest due to their extraordinary mechanical properties as well as thermal stability and oxidation resistance. The unique structure and exceptional properties make nanocomposite materials a possible alternative to traditional polycrystalline materials, which have met their limits in many recent engineering applications. In particular, nanocomposite coatings synthesized by plasma-assisted deposition processes under highly non-equilibrium conditions provide a high potential for new applications as protective and functional coatings in automotive, aerospace, tooling, electronic, or manufacturing industry.
This book provides a comprehensive overview of the synthesis of Si-containing hard nanocomposite coatings based on transition metal nitrides by plasma-based thin film processing. It demonstrates the full versatility of these nanocomposites for low Si-containing coatings tailored with superior mechanical properties and novel high Si-containing nanocomposite coatings with extraordinary thermal stability and resistance against oxidation optimized for high-temperature applications. It pays special attention to understanding growth mechanisms of these structures under specific deposition conditions, structure–property relations, and stability of individual constituents to enhance their functionality for various applications.
Table of Contents
Synthesis of New Nanostructured Materials
Multilayers and Superlattices
Thin Film Processing
Principles of Plasma Discharges
Physical Sputtering and Transport of Sputtered Material
Sputter Deposition Techniques. Reactive Sputter Deposition
Film Formation and Structure
of Sputtered Material
Nucleation and Growth
Microstructure of Thin Films, Structure Zone Models, Advantages and Limitations of Sputter Deposition Processes
Structure-Property Relation in Hard Films
Me-Si-N Films With a Low and Intermediate Si Content
Structure, Morphology and Phase Composition Hardness and Macrostress Oxidation Resistance Problems with Reproducibility
Novel nanocomposite films - Zr-Si-N Films with a High Si Content
Chemical Bonding and Phase Composition
Electrical and Optical Properties
Effect of Substrate Bias
High Si-containing W-Si-N Nanocomposite Films
Chemical Bonding and Phase Composition
Characterization of Thin Films.
X-Ray Diffraction Analysis
Film Thickness Measurement
Scanning Electron Microscopy
Energy Dispersive X-Ray Spectrometry
Differential Scanning Calorimetry
Rostislav Daniel is associate professor at the Department of Physical Metallurgy and Materials Testing, University of Leoben, Austria. He received his MSc in applied sciences and computer engineering, applied physics and physical engineering and PhD in applied sciences and computer engineering, plasma physics and physics of thin films at the University of West Bohemia. His main research areas are plasma physics and physics of thin films, synthesis of advanced hard nanocrystalline and nanocomposite thin films of optimized structures and physical properties, advanced structural characterization of solids, characterization of mechanical properties of thin films and bulk solids, measurements of residual stresses in thin films by optical and x-ray diffraction techniques, investigations of thermo-mechanical properties of thin films and bulk solids, study of thermal stability and oxidation resistance of thin films and bulk solids, and coating design and architecture.
Jindřich Musil is professor of applied physics at the University of West Bohemia, Plzeň, Czech Republic. He received his MSc in electrical engineering at the Military Technical University, Brno, Czech Republic; PhD in physics and mathematics at Czechoslovak Academy of Sciences, Prague, Czech Republic; and DSc in physics and mathematics at Czechoslovak Academy of Sciences, Prague, Czech Republic. His main research areas are electromagnetic field, propagation of electromagnetic waves, microwave plasma discharges, plasma physics, thermonuclear fusion, lasers, plasma chemistry and physics of thin films, PVD and PACVD of thin films, high-rate pulsed reactive magnetron sputtering, and development of new technological processes and advanced systems for synthesis of novel hard and functional nanocomposite coatings.