Silicon and Silicide Nanowires: Applications, Fabrication, and Properties, 1st Edition (e-Book) book cover

Silicon and Silicide Nanowires

Applications, Fabrication, and Properties, 1st Edition

Edited by Yu Huang, King-Ning Tu

Pan Stanford

484 pages

Purchasing Options:$ = USD
Hardback: 9789814303460
pub: 2013-10-24
eBook (VitalSource) : 9780429189609
pub: 2016-04-19
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Nanoscale materials are showing great promise in various electronic, optoelectronic, and energy applications. Silicon (Si) has especially captured great attention as the leading material for microelectronic and nanoscale device applications. Recently, various silicides have garnered special attention for their pivotal role in Si device engineering

Table of Contents

In situ Observations of Vapor-Liquid-Solid Growth of Silicon Nanowires. Growth of Germanium, Silicon, and Ge-Si Heterostructured Nanowires. Transition Metal Silicide Nanowires: Synthetic Methods and Applications. Metal Silicide Nanowires: Growth and Properties. Formation of Epitaxial Silicide in Silicon Nanowires. Interaction between Inverse Kirkendall Effect and Kirkendall Effect in Nanoshells and Nanowires. Electrical Transport Properties of Doped Silicon Nanowires. Silicon Nanowires and Related Nanostructures as Lithium-Ion Battery Anodes. Porous Silicon Nanowires. Nanoscale Contact Engineering for Si Nanowire Devices. Index.

About the Editors

Yu Huang is a faculty member in the Department of Materials Sciences and Engineering at the University of California, Los Angeles (UCLA), USA. She received her PhD in physical chemistry from Harvard University, USA. Her research focuses on the fundamental principles governing nanoscale material synthesis and assembly at the molecular level, which can be utilized to design nanostructures and nanodevices with unique functions and properties to address critical challenges in electronics, energy science, and biomedicine. She has received several recognitions including MRS student award, the Grant Prize Winner of Collegiate Inventors' Competition, the IUPAC Young Chemist Prize, Lawrence Postdoctoral Fellowship, MIT Technology Review World's Top 100 Young Innovator Award, NASA Nanotech Brief Nano 50 Innovator award, the Kavli Fellowship, the Sloan Fellowship, the PECASE, DARPA Young Faculty Award and, the NIH Director's New Innovator Award.

King-Ning Tu received his PhD in applied physics from Harvard University in 1968 and was associated with IBM T. J. Watson Research Center for 25 years before joining the UCLA, USA, in 1993. He is distinguished professor in the Department of Materials Science and Engineering and the Department of Electrical Engineering at the UCLA. He has over 500 journal publications with citations over 18,000 and h-factor of 74. He received the TMS John Bardeen Award in 2013. He has co-authored the textbook Electronic Thin Film Science and authored the books Solder Joint Technology: Materials, Properties, and Reliability and Electronic Thin-Film Reliability. His research interests are focused on metal-silicon reactions, solder joint reactions, point-contact reactions in nanowires, polarity effect of electromigration on interfacial reactions, and kinetic theories of interfacial reactions.

Subject Categories

BISAC Subject Codes/Headings:
TECHNOLOGY & ENGINEERING / Electronics / Microelectronics