Spacer Engineered FinFET Architectures : High-Performance Digital Circuit Applications book cover
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Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications





ISBN 9780367573553
Published June 30, 2020 by CRC Press
138 Pages

 
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Book Description

This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

Table of Contents

Preface



About the Authors



 





Chapter 1 ◾ Introduction to Nanoelectronics



Chapter 2 ◾ Tri-Gate FinFET Technology and Its Advancement



Chapter 3 ◾ Dual-k Spacer Device Architecture and Its Electrostatics



Chapter 4 ◾ Capacitive Analysis and Dual-k FinFET-Based Digital Circuit Design



Chapter 5 ◾ Design Metric Improvement of a Dual-k–Based SRAM Cell



Chapter 6 ◾ Statistical Variability and Sensitivity Analysis



 





INDEX

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