This work presents advances in thin films for applications in the fields of integrated optics, micro-optics, optical telecommunications and optoelectronics. It delineates the performance characteristics needed for graded coatings, damage-resistant laser coatings and many others. Basic theory and applications are illustrated.
". . .[written] by 25 authors actively involved in thin film work, many of whom are very well known. . .the volume is well produced. . .The approach is. . .a very practical one and results are presented for real systems, with detailed diagrams of apparatus used. . .an excellent. . .guide. "
---Journal of Modern Optics
Part 1 Coating design: thin-film optical coating design. Part 2 Deposition techniques and related topics: starting materials; optical monitoring; reactive physical vapor deposition processes; ion assisted deposition; ion beam sputtering; plasma impulse chemical vapor deposition; molecular beam deposition; uniformity. Part 3 Characterization techniques: spectrophotometric methods for refractive index determination; ellipsometric measurements; characterization of absorption by photothermal deflection; light scattering from multilayer optics; guided wave techniques; mechanical properties of optical thin films. Part 4 Applications: graded coatings; damage-resistant laser coatings; thin-film optical coatings for optoelectronic devices.