1st Edition
Defect Recognition and Image Processing in Semiconductors 1997 Proceedings of the seventh conference on Defect Recognition and Image Processing, Berlin, September 1997
524 Pages
by
CRC Press
524 Pages
by
Routledge
Also available as eBook on:
Defect Recognition and Image Processing in Semiconductors 1997 provides a valuable overview of current techniques used to assess, monitor, and characterize defects from the atomic scale to inhomogeneities in complete silicon wafers. This volume addresses advances in defect analyzing techniques and instrumentation and their application to substrates, epilayers, and devices. The book discusses the... Read more
Preface. Glossary. Nanoscanning (9 papers). Electron beam methods (9 papers). Optical methods (8 papers). Mapping (10 papers). X-ray methods (4 papers). Other and combined methods (8 papers). Image processing. Standardization. Si and SiGe mixed crystals (15 papers). SiC (3 papers). GaN (6 papers). Other III-V compounds (12 papers). II-VI compounds, phosphors, oxides and alternative substrates (4 papers). Processing and defects (3 papers). Defect recognition in devices and degradation (11 papers). Author and subject indices.
Biography
Doneker, J.
listed in SPIE-OE Reports No 174, 1998
listed in Scitech Book News, September 1998
Abstracted in INSPEC Database.
in SPIE-OE Reports No 174, 1998
listed in Scitech Book News, September 1998
Abstracted in INSPEC Database.
