1st Edition

Engineering Thin Films and Nanostructures with Ion Beams

Edited By Emile Knystautas Copyright 2005
592 Pages
by CRC Press

590 Pages
by CRC Press

592 Pages
by CRC Press

While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices,... Read more
Introduction, Single Ion Induced Spike Effects on Thin Metal Films: Observation and Simulation, on Beam Effects in Magnetic Thin Films, Selected Topics in Ion Beam Surface Engineering, Optical Effects of Ion Implantation, Metal Alloy Nanoclusters by Ion Implantation in Silica, Intrinsic Residual Stress Evolution in Thin Films During Energetic Particle Bombardment, Industrial Aspects of Ion Implantation Equipment and Ion Beam Generation, Nanostructured Transition-Metal Layers, Nuclear Tracks and Nanostructures, Forensic Applications of Ion-Beam Mixing and Surface Spectroscopy of Latent Fingerprints, Glossary

Biography

Émile Knystautas