While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications.
Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that:
From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Introduction, Single Ion Induced Spike Effects on Thin Metal Films: Observation and Simulation, on Beam Effects in Magnetic Thin Films, Selected Topics in Ion Beam Surface Engineering, Optical Effects of Ion Implantation, Metal Alloy Nanoclusters by Ion Implantation in Silica, Intrinsic Residual Stress Evolution in Thin Films During Energetic Particle Bombardment, Industrial Aspects of Ion Implantation Equipment and Ion Beam Generation, Nanostructured Transition-Metal Layers, Nuclear Tracks and Nanostructures, Forensic Applications of Ion-Beam Mixing and Surface Spectroscopy of Latent Fingerprints, Glossary