1st Edition

Gaseous Electronics Tables, Atoms, and Molecules

By Gorur Govinda Raju Copyright 2012
    822 Pages 798 B/W Illustrations
    by CRC Press

    822 Pages 798 B/W Illustrations
    by CRC Press

    With the constant emergence of new research and application possibilities, gaseous electronics is more important than ever in disciplines including engineering (electrical, power, mechanical, electronics, and environmental), physics, and electronics.

    The first resource of its kind, Gaseous Electronics: Tables, Atoms, and Molecules fulfills the author’s vision of a stand-alone reference to condense 100 years of research on electron-neutral collision data into one easily searchable volume. It presents most—if not all—of the properly classified experimental results that scientists, researchers, and students require for a theoretical and practical understanding of collision properties and their impact.

    An unprecedented collection and analysis of electron neutral collision properties

    This book follows a new user-friendly format that enables readers to easily retrieve, analyze, and apply specific atomic/molecular information as needed. In his previous work, Gaseous Electronics: Theory and Practice, the author first explored electron–neutron interactions. To clarify the complex fundamental processes involved, he cited as much experimental data on atoms and molecules as limited space would allow. Completing that task, this handy reference more fully compiles essential revised data on more than 420 atoms and molecules, arranging it into easily digestible chapters, sections, and appendices. Analysis parameters include total scattering, ionization, excitation, attachment cross sections, ionization and attachment coefficients, attachment rates, and ion drift velocity.

    Some recent research areas in gaseous electronics include:

    • Environmentally efficient and protective lighting devices
    • Plasma research for power generation and space applications
    • Medical applications (some involving skin treatment and healing)

    Written entirely in SI units, the book includes hundreds of tables, figures, and specially drawn charts, with data expressed in both tabular and graphical form. Each chapter stands independently and contains references for further research.

    Section I: 1 Atom

    Argon (Ar)

    Cesium (Cs)

    Helium (He)

    Krypton (Kr)

    Mercury (Hg)

    Neon (Ne)

    Potassium (K)

    Sodium (Na)

    Xenon (Xe)

    Section II: 2 Atoms

    Bromine (Br2)

    Carbon Monoxide (CO)

    Chlorine (Cl2)

    Deuterium (D2)

    Deuterium Bromide (DBr)

    Deuterium Chloride (DCl)

    Deuterium Iodide (DI)

    Fluorine (F2)

    Hydrogen (H2)

    Hydrogen Bromide (HBr)

    Hydrogen Chloride (HCl)

    Hydrogen Fluoride (HF)

    Hydrogen Iodide (HI)

    Iodine (I2)

    Nitric Oxide (NO)

    Nitrogen (N2)

    Oxygen (O2)

    Section III: 3 Atoms

    Carbon Dioxide (CO2)

    Carbon Disulfide (CS2)

    Carbon Oxysulfide (COS)

    Chlorine Dioxide (ClO2)

    Heavy Water (D2O)

    Hydrogen Sulfide (H2S)

    Nitrogen Dioxide (NO2)

    Nitrous Oxide (N2O)

    Ozone (O3)

    Sulfur Dioxide (SO2)

    Water Vapor (H2O)

    Section IV: 4 Atoms

    Acetylene (C2H2)

    Ammonia (NH3)

    Boron Trichloride (BCl3)

    Boron Trifluoride (BF3)

    Deuterated Ammonia (ND3)

    Nitrogen Trifluoride (NF3)

    Phosphine (PH3)

    Phosphorous Trifluoride (PF3)

    Section V: 5 Atoms

    Bromochloromethane (CH2BrCl)

    Bromomethane (CH3Br)

    Bromotrichloromethane (CBrCl3)

    Bromotrifluoromethane (CBrF3)

    Carbon Tetrachloride (CCl4)

    Chlorodibromomethane (CHBr2Cl)

    Chloromethane (CH3Cl)

    Chlorotrifluoromethane (CClF3)

    Deuterated Methane (CD4)

    Dibromodifluoromethane (CBr2F2)

    Dibromomethane (CH2Br2)

    Dichlorodifluoromethane (CCl2F2)

    Dichloromethane (CH2Cl2) and Difluoromethane (CH2F2)

    Fluoromethane (CH3F)

    Formic Acid (CH2O2)

    Germane (GeH4)

    Germanium Tetrachloride (GeCl4)

    Iodomethane (CH3I)

    Methane (CH4)

    Silane (SiH4)

    Silicon Tetrafluoride (SiF4)

    Sulfuryl Fluoride (SO2F2)

    Tetrabromomethane (CBr4)

    Tetrachlorosilane (SiCl4)

    Tetrafluoromethane (CF4)

    Tribromofluoromethane (CBr3F)

    Tribromomethane (CHBr3)

    Trichlorofluoromethane (CCl3F)

    Trichloromethane (CHCl3)

    Trifluoromethane (CHF3)

    Section VI: 6 Atoms

    Dibromoethene (C2H2Br2)

    Dichloroethene (C2H2Cl2)

    Ethylene (C2H4)

    Methanethiol (CH3SH)

    Methanol (CH3OH)

    Tetrachloroethene (C2Cl4)

    Tetrafluoroethene (C2F4)

    Tribromoethene (C2HBr3)

    Trichloroethene (C2HCl3)

    Section VII: 7 Atoms

    Allene (C3H4)

    Cyclopropene (C3H4)

    Ethanal (C2H4O)

    Methylamine (CH3NH2)

    Propyne (C3H4)

    Sulfur Hexafluoride (SF6)

    Tungsten Hexafluoride (WF6)

    Uranium Hexafluoride (UF6)

    Section VIII: 8 Atoms

    Bromofluoroethane (C2H4BrF)

    Bromotrifluoroethane (C2H2BrF3)

    Chloroethane (C2H5Cl)

    Dibromodifluoroethane (C2H2Br2F2)

    Dibromoethane (C2H4Br2)

    Dibromotetrafluoroethane (C2Br2F4)

    Dichloroethane (C2H4Cl2)

    Disilane (Si2H6)

    Ethane (C2H6)

    Hexachloroethane (C2Cl6)

    Hexafluoroethane (C2F6)

    Pentachloroethane (C2HCl5)

    Tetrabromoethane (C2H2Br4)

    Tetrachloroethane (C2H2Cl4)

    Tribromoethane (C2H3Br3)

    Trichloroethane (C2H3Cl3)

    1,1,1-Trifluoroethane (C2H3F3)

    Section IX: 9 Atoms

    Hexafluoropropene (1-C3F6)

    Propylene (C3H6) and Cyclopropane (c-C3H6)

    Section X: 10 Atoms

    Acetone (C3H6O)

    Cyclobutene (C4H6), 1,3-Butadiene (1,3-C4H6), 2-Butyne (2-C4H6)

    Hexafluorocyclobutene (C4F6), Hexafluoro-1,3-Butadiene (1,3-C4F6), and Hexafluoro-2-Butyne (2-C4F6)

    Section XI: 11 Atoms

    Chloropropane (C3H7Cl)

    Perfluoropropane (C3F8)

    Propane (C3H8)

    Section XII: 12 Atoms

    Benzene (C6H6) and Deuterated Benzene (C6D6)

    Bromobenzene (C6H5Br)

    Butene (C4H8)

    Chlorobenzene (C6H5Cl)

    Chloropentafluorobenzene (C6F5Cl)

    1,3-Difluorobenzene (1,3-C6H4F2)

    1,4-Difluorobenzene (C6H4F2)

    Fluorobenzene (C6H5F)

    Hexafluorobenzene (C6F6)

    Iodobenzene (C6H5I)

    Perfluorocyclobutane (c-C4F8), Perfluoro-2-Butene (2-C4F8), and Perfluoroisobutene (i-C4F8)

    1-Propanol (1-C3H8O) and 2-Propanol (2-C3H8O)

    Section XIII: More than 12 Atoms

    Butane (C4H10)

    Chlorobutane (C4H9Cl), 1-Chlorobutane (1-C4H9Cl), 2-Chlorobutane (2-C4H9Cl), and t-Chlorobutane (t-C4H9Cl)

    Chloropentane (C5H11Cl)

    Cyclopentane (C5H10)

    Hexane (C6H14) and Cyclohexane (C6H12)

    Isobutane (i-C4H10)

    Isooctane (i-C8H18)

    Octane (C8H18)

    Pentane (C5H12)

    Perfluorobutane (n-C4F10) and Perfluoroisobutane (i-C4F10)

    Tetrahydrofuran (C4H8O) and α-Tetrahydrofurfuryl Alcohol (C5H10O2)

    Toluene (C7H8)

    Section XIV: Gas Mixtures


    Section XV: Appendices

    Appendix 1: Fundamental Constants

    Appendix 2: Target Particles (Namewise)

    Appendix 3: Target Particles (Formulawise)

    Appendix 4: Attachment Peaks and Cross Sections

    Appendix 5: Attachment Rates

    Appendix 6: Atomic Ionization Cross Sections

    Appendix 7: Ionization Cross Sections—Molecules

    Appendix 8: Important Relationships

    Appendix 9: Quadrupole Moments of Target Particles

    Appendix 10: Relative Dielectric Strength of Gases


    Professor Gorur Govinda Raju obtained a BEng degree from the University of Bangalore (India) and a Ph.D from the University of Liverpool (England) in 1963. He joined the University of Windsor (Canada) in 1980 and became professor and head of the Electrical and Computer Engineering Department during 1989–97 and 2000–2002. He has been on the board and program committee of the Conference on Electrical Insulation and Dielectric Phenomena (IEEE) for a number of years, and he is currently an emeritus professor at the University of Windsor. Professor Raju has been a consultant on electrical power and dielectric phenomena to the government of India, Detroit Edison Co., and several other industries. He has published three previous book, as well as more than 140 papers in international journals and conferences. His experimental and theoretical contributions to gaseous electronics continue to be cited in research papers on this topic.

    "Readers working in the areas of plasma processing or plasma/arc related technology will find this book a useful reference source for values of various plasma parameters. … a very useful reference book for hard-to-find information on gaseous electronic parameters."
    IEEE Electrical Insulation Magazine