This unique monograph discusses all aspects of the design and operation of electrophysical ultrahigh-vacuum pumps (EUVP). The adsorption-diffusion model of interaction of gas molecules with metal getters is presented, together with the getter films sorption characteristics. A mathematical model of molecular transfer in electrophysical pumps and the
Table of Contents
Series Preface, Preface, Symbols and Abbreviations, Chapter 1: Basic Characteristics of Electrophysical Pumps, 1.1. Operating Principle and Classification of Electrophysical Pumps, 1.2. Comparative Characteristics of Different Types of Electrophysical Pumps, 1.3. Kinetics of Sorption of Gases by Nonrenewable Getter Films, 1.4. Sorption Characteristics of Titanium and Renewable Titanium Films, Chapter 2: Principles of the Planning and Optimization of the Geometric Structure of Electrophysical Pumps, 2.1. Basic Planning and Optimization of Surface-Action Pumps, 2.2. Mathematical Model and System of Generalized Criteria for Optimizing the Geometric Structure of Electrophysical Pumps, 2.3. Basic Characteristics of Electrophysical Pumps, 2.4. Performance Parameters and Structural Characteristics of Pumps of Various Design, 2.5. Algorithm for Planning and Optimizing the Performance of Electrophysical Pumps, Chapter 3: Evaporative Getter and Getter-Ion Pumps with Thermal Deposition of Getter Films, 3.1. Design and Operating Characteristics of Evaporators, 3.2. Engineering of Evaporation Pumps, 3.3. Evaporation Getter Pumps, 3.4. Evaporation Getter-Ion Pumps, Chapter 4: Electrophysical Pumps with Plasma Sources of Getter Films, 4.1. Physical Features of Plasma Sources of Getter Films, 4.2. Magnetic Control of an Arc Discharge, 4.3. Design and Operating Characteristics of Plasma Sources of Getter Films, 4.4. Getter and Getter-Ion Pumps with Plasma Evaporators, Chapter 5: Sputter-Ion Pumps. Physical Processes, 5.1.Gas Discharges, 5.2. Reflection and Capture of Gaseous Particles, 5.3. Sputtering of the Cathode Plates, 5.4. Special Features of the Pumping of Different Gases, Chapter 6: Sputter-Ion and Combined Pumps. Calculation, Design, and Operation, 6.1. Engineering Calculations and Design of Sputter-Ion Pumps, 6.2. Industrial Sputter-Ion Pumps, 6.3. Combined Getter-Ion Pumps, 6.4. Integrated Vacuum Systems Based on Sputter-Ion Pumps, 6.5. Operation of Sputter-Ion Pumps, Chapter 7: Nonevaporable Getters and Pumping Devices Based on Them, 7.1. Nonevaporable Getters, 7.2. Kinetics of Sorption-Desorption Processes, 7.3. Vacuum-Physical and Operating Features of Nonevaporable Getters, 7.4. Nonevaporable Getter Pumps, Chapter 8: Principles of the Creation of Nontraditional Electrophysical Pumps, 8.1. Implantation of Fast Gaseous Particles in Condensed Media, 8.2. Implantation Pumping Devices, 8.3. Membrane and Catalytic Pumps, 8.4. Barrier Model of the Interaction of Gaseous Particles with Condensed Media, References, Index
Georgii Leonidovich Saksaganskii D. V. Efremov Scientific Research Institute of Electrophysical Apparatus, St. Petersburg, Russia
"The outline and methodology proposed by Dr. Saksaganskii is unique... The electrophysical pumps used here will be central to work in accelerator and other large particle collider systems. Nowhere in the current literature is there and extensive collection of design and calculation material available to researchers... I highly recommend the addition of this work to the English literature."
Professor John O'Hanlon, University of Arizona, USA