This is the first-ever book on the preparation, atomic-level description, and chemistry of ultrathin silica films grown on metal substrates. Silica (SiO2) is one of the key materials in many modern technological applications. Further miniaturization of nanoelectronic devices necessitates rational design of ultrathin silica films on electrically conductive substrates. A growing body of experimental and theoretical results provide the basis for placing single-layer silicates into the family of truly two-dimensional materials and receiving the name silicatene. In addition, thin silica films are well suited for studying chemical reactions on silica surfaces. Moreover, using thin silica films modified with other metals, one can address the surface structures and chemistry of natural silicates, such as clays and zeolites. Finally, studies on well-defined silica films may provide an atomic-level description of crystal–glass transitions.
Table of Contents
Silica and Silicates. Preparation of Thin Oxide Films: Concepts and Toolkits. Thin Silica films on Si and SiC. Ultrathin Silica Films on Metals. Defects in Ultrathin Silica Films. Ultrathin Films of Al, Fe, Ti Silicates. Adsorption on Ultrathin Silicate Films: Surface and “Sub-surface” Reactions. Water Adsorption on Silica. Silicatene una Graphene.
Shamil Shaikhutdinov after several postdoc positions in Germany and France, has been, since 2004, leading the group “Structure and Reactivity” at the Fritz-Haber Institute (Berlin).