Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization.
The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology.
Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA.
Section I—Fundamentals. Overview. Kinematics. Cross Section. Ion Stopping. Backscattering Spectrometry. Elastic Recoil Detection Analysis. Nuclear Reaction Analysis. Particle-Induced X-Ray Emission Analysis. Ion Channeling. Section II—Applications. Thin Film Depth Profiling. Defects Measurements of a Crystalline Solid. Nuclear Energy Research Applications. Art and Archaeology Applications. Biomedical Applications. IBA Software. Appendices.