1 Introduction 1.1 Technologies That Underline the Information Society 1.2 World of Micro and Nano 1.3 Contents and Construction of This Book 2 Vacuum and Gas Kinetics 2.1 Introduction 2.2 Vacuum and Equation of State 2.4 Total Pressure and Partial Pressure 2.5 Distribution Law of Gas Velocity 2.6 Mean Free Path and Collision Probability 2.7 Flow of Molecules Under Vacuum 2.8 Vacuum Equipments 3 Fundamentals of Plasma 3.1 Introduction 3.2 What Is a Plasma? 3.3 Collision of Electrons and Molecules 3.4 Plasma Adjacent to Electrodes 3.5 Plasma Apparatus and the Interior of a Plasma 4 Physical Vapor Deposition 4.1 Introduction 4.2 Evaporation 4.3 Sputtering 5 Film Formation Process 5.1 Introduction 5.2 Thin Film Growth 5.3 Nucleation 5.4 Development of Film Microstructures 6 Etching 6.1 Introduction 6.2 Classification of Etching 6.3 Wet Etching 6.5 Chemical Dry Etching 6.6 Physical and Chemical Dry Etching 7 Photolithography 7.1 Introduction 7.2 Introduction to Photolithography 7.3 Photoresist Process 7.4 Photomask 7.5 Exposure
Biography
Eiichi Kondoh, University of Yamanashi, Japan
