In this book, the fundamentals of micro- and nanofabrication are described on the basis of the concept of “using gases as a fabrication tool.” Unlike other books available on the subject, this volume assumes only entry-level mathematics, physics, and chemistry of undergraduates or high-school students in science and engineering courses. Necessary theories are plainly explained to help the reader learn about this new attractive field and enable further reading of specialized books. The book is an attractive guide for students, young engineers, and anyone getting involved in micro- and nanofabrication from various fields including physics, electronics, chemistry, and materials sciences.
Table of Contents
1 Introduction 1.1 Technologies That Underline the Information Society 1.2 World of Micro and Nano 1.3 Contents and Construction of This Book 2 Vacuum and Gas Kinetics 2.1 Introduction 2.2 Vacuum and Equation of State 2.4 Total Pressure and Partial Pressure 2.5 Distribution Law of Gas Velocity 2.6 Mean Free Path and Collision Probability 2.7 Flow of Molecules Under Vacuum 2.8 Vacuum Equipments 3 Fundamentals of Plasma 3.1 Introduction 3.2 What Is a Plasma? 3.3 Collision of Electrons and Molecules 3.4 Plasma Adjacent to Electrodes 3.5 Plasma Apparatus and the Interior of a Plasma 4 Physical Vapor Deposition 4.1 Introduction 4.2 Evaporation 4.3 Sputtering 5 Film Formation Process 5.1 Introduction 5.2 Thin Film Growth 5.3 Nucleation 5.4 Development of Film Microstructures 6 Etching 6.1 Introduction 6.2 Classification of Etching 6.3 Wet Etching 6.5 Chemical Dry Etching 6.6 Physical and Chemical Dry Etching 7 Photolithography 7.1 Introduction 7.2 Introduction to Photolithography 7.3 Photoresist Process 7.4 Photomask 7.5 Exposure
Eiichi Kondoh, University of Yamanashi, Japan