Microlithography: Science and Technology, Third Edition, 3rd Edition (Hardback) book cover


Science and Technology, Third Edition, 3rd Edition

Edited by Bruce W. Smith, Kazuaki Suzuki

CRC Press

900 pages | 570 B/W Illus.

Purchasing Options:$ = USD
Hardback: 9781439876756
pub: 2019-11-01
SAVE ~$43.99
Available for pre-order

FREE Standard Shipping!


This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts.

New in the Second Edition

In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including Immersion Lithography, 157nm Lithography, Electron Projection Lithography (EPL), Extreme Ultraviolet (EUV) Lithography, Imprint Lithography, Photoresists for 193nm and Immersion Lithography and Scatterometry.

Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.

Table of Contents


System Overview of Optical Steppers and Scanners; Michael S. Hibbs

Optical Lithography Modeling; Chris A. Mack

Optics for Photolithography; Bruce W. Smith

Excimer Laser for Advanced Microlithography; Palash Das

Alignment and Overlay; Gregg M. Gallatin

Electron Beam Lithography System; Kazuaki Suzuki

X-Ray Lithography; Takumi Ueno

EUV Lithography; Stefan Wurm and Charles Gwyn

Imprint Lithography; Douglas J. Resnick


Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen

Resist Processing; Bruce W. Smith

Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty

Dry Etching of Photoresists; Roderick R. Kunz


Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur

Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar


About the Editors

Kazuaki Suzuki received his BS degree in plasma physics (1981), and his MS degree in X-Ray astronomy (1983) from Tokyo University. He retired from a doctorate course in X-ray astronomy joined the Nikon Corporation in 1984. He has participated in several projects of new concept exposure tools such as KrF excimer laser stepper, KrF excimer laser scanner, the electron-beam projection lithography tool and the full field EUV scanner. He has authored and coauthored many papers in the field of exposure tools and related technologies. He also holds numerous patents in these areas. Now he belongs to Research and Development Headquarters, Core Technology Center of Nikon Corporation.

Subject Categories

BISAC Subject Codes/Headings:
TECHNOLOGY & ENGINEERING / Electronics / General
TECHNOLOGY & ENGINEERING / Electronics / Microelectronics