Microlithography: Science and Technology, 3rd Edition (Hardback) book cover

Microlithography

Science and Technology, 3rd Edition

Edited by Bruce W. Smith, Kazuaki Suzuki

CRC Press

864 pages | 570 B/W Illus.

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Hardback: 9781439876756
pub: 2020-05-20
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Description

The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the worlds’ leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme-ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved.

New in the Third Edition

In addition the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modelling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography.

The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition.

Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.

Table of Contents

EXPOSURE SYSTEM

System Overview of Optical Steppers and Scanners; Michael S. Hibbs

Optical Lithography Modeling; Chris A. Mack

Optics for Photolithography; Bruce W. Smith

Excimer Laser for Advanced Microlithography; Palash Das

Alignment and Overlay; Gregg M. Gallatin

Electron Beam Lithography System; Kazuaki Suzuki

X-Ray Lithography; Takumi Ueno

EUV Lithography; Stefan Wurm and Charles Gwyn

Imprint Lithography; Douglas J. Resnick

RESISTS AND PROCESSING

Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen

Resist Processing; Bruce W. Smith

Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty

Dry Etching of Photoresists; Roderick R. Kunz

METROLOGY AND NANOLITHOGRAPHY

Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur

Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar

Index

About the Editors

Bruce W. Smith is a Distinguished Professor of Engineering at the Rochester Institute of Technology. He has been involved in teaching and research in microelectronic and microsystems engineering for over 35 years. His areas of research include semiconductor processing, DUV, VUV, immersion, and EUV lithography, thin films, optics, and microelectronic materials. He has authored over 250 technical publications, given over 100 technical talks, and received over 25 patents, licensing his technology both nationally and internationally. He has worked extensively with individuals and organizations in the semiconductor industry including industrial partners in the Semiconductor Research Corporation (SRC), SEMATECH, and IMEC. He is the recipient of numerous teaching and research awards including the IEEE Technical Excellence Award, the AVS Excellence in Leadership Award, the SPIE Research Mentoring Award, and the RIT Trustees Scholarship Award, and he is in the RIT Innovator Hall of Fame. Professor Smith is a Fellow of the Institute of Electrical and Electronics Engineers (IEEE), the Optical Society of America (OSA) and the Society for Photo-optical Instrumentation Engineers (SPIE).

Kazuaki Suzuki has been a project manager for developing new concept exposure tools at Nikon Corporation, such as the early generation KrF excimer laser stepper, the first generation KrF excimer laser scanner, the electron-beam projection exposure system and the full field EUV scanner. He has authored and coauthored many papers in the field of exposure tool and related technologies including advanced equipment control by using metrology data. He also holds numerous patents in the same field. In the first decade of this century, he had been a member of program committee of SPIE Microlithography and other international conferences such as MNE in Europe and MNC in Japan. He was one of associate editors of Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3) from 2002 to 2009.

Subject Categories

BISAC Subject Codes/Headings:
TEC007000
TECHNOLOGY & ENGINEERING / Electrical
TEC008000
TECHNOLOGY & ENGINEERING / Electronics / General
TEC008070
TECHNOLOGY & ENGINEERING / Electronics / Microelectronics
TEC019000
TECHNOLOGY & ENGINEERING / Lasers & Photonics