The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the worlds’ leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme-ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved.
New in the Third Edition
In addition the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modelling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography.
The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition.
Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
System Overview of Optical Steppers and Scanners; Michael S. Hibbs
Optical Lithography Modeling; Chris A. Mack
Optics for Photolithography; Bruce W. Smith
Excimer Laser for Advanced Microlithography; Palash Das
Alignment and Overlay; Gregg M. Gallatin
Electron Beam Lithography System; Kazuaki Suzuki
X-Ray Lithography; Takumi Ueno
EUV Lithography; Stefan Wurm and Charles Gwyn
Imprint Lithography; Douglas J. Resnick
RESISTS AND PROCESSING
Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen
Resist Processing; Bruce W. Smith
Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty
Dry Etching of Photoresists; Roderick R. Kunz
METROLOGY AND NANOLITHOGRAPHY
Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur
Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar