The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved.
New in the Third Edition
In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography.
The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition.
Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Chapter 1 Lithography, Etch, and Silicon Process Technology
[Matthew Colburn, Derren N. Dunn, and Michael A. Guillorn]
Chapter 2 Optical Nanolithography
[Bruce W. Smith]
Chapter 3 Multiple Patterning Lithography
[Carlos Fonseca, Chris Bencher, and Bruce Smith]
Chapter 4 EUV Lithography
Stefan Wurm, Winfried Kaiser, Udo Dinger, Stephan Müllender,
Bruno La Fontaine, Obert R. Wood II, and Mark Neisser]
Chapter 5 Alignment and Overlay
[David Laidler and Gregg M. Gallatin]
Chapter 6 Design for Manufacturing and Design Process Technology Co-Optimization
[John Sturtevant and Luigi Capodieci]
Chapter 7 Chemistry of Photoresist Materials
[Takumi Uemo, Robert D. Allen, and James Thackeray]
Chapter 8 Photoresist and Materials Processing
[Bruce W. Smith]
Chapter 9 Optical Lithography Modeling
[Chris A. Mack, John J. Biafore, and Mark D. Smith]
Chapter 10 Maskless Lithography
Chapter 11 Imprint Lithography
[Doug Resnick and Helmut Schift]
Chapter 12 Metrology for Nanolithography
[Kazuaki Suzuki and Eran Amit]
Chapter 13 Directed Self-Assembly of Block Copolymers
[Chi-chun Liu, Kenji Yoshimoto, Juan de Pablo, and Paul Nealey]
About the first edition…
"…The editors have done an excellent job of gathering the knowledge of a number of world experts and blending it into a harmonious whole which will serve as a reference for some time to come, even in this fast-moving field."
-International Journal of Electrical Engineering Education