1st Edition

Nanoparticle Engineering for Chemical-Mechanical Planarization Fabrication of Next-Generation Nanodevices

By Ungyu Paik, Jea-Gun Park Copyright 2009
224 Pages
by CRC Press

224 Pages
by CRC Press

In the development of next-generation nanoscale devices, higher speed and lower power operation is the name of the game. Increasing reliance on mobile computers, mobile phone, and other electronic devices demands a greater degree of speed and power. As chemical mechanical planarization (CMP) progressively becomes perceived less as black art and more as a cutting-edge technology, it is emerging as... Read more

Overview of CMP Technology. Interlayer Dielectric CMP Shallow Trench Isolation CMP. Copper CMP. Nanotopography. Novel CMP for Next-Generation Devices. References. Index.

Biography

Hanyang University, Seoul, South Korea