Novel Nanocomposite Coatings: Advances and Industrial Applications, 1st Edition (Hardback) book cover

Novel Nanocomposite Coatings

Advances and Industrial Applications, 1st Edition

Edited by Rostislav Daniel, Jindřich Musil

Pan Stanford

344 pages | 4 Color Illus. | 113 B/W Illus.

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pub: 2014-12-16
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Description

Nanocomposite materials as a special class of nanostructured materials have recently attracted great interest due to their extraordinary mechanical properties as well as thermal stability and oxidation resistance. The unique structure and exceptional properties make nanocomposite materials a possible alternative to traditional polycrystalline materials, which have met their limits in many recent engineering applications. In particular, nanocomposite coatings synthesized by plasma-assisted deposition processes under highly non-equilibrium conditions provide a high potential for new applications as protective and functional coatings in automotive, aerospace, tooling, electronic, or manufacturing industry.

This book provides a comprehensive overview of the synthesis of Si-containing hard nanocomposite coatings based on transition metal nitrides by plasma-based thin film processing. It demonstrates the full versatility of these nanocomposites for low Si-containing coatings tailored with superior mechanical properties and novel high Si-containing nanocomposite coatings with extraordinary thermal stability and resistance against oxidation optimized for high-temperature applications. It pays special attention to understanding growth mechanisms of these structures under specific deposition conditions, structure–property relations, and stability of individual constituents to enhance their functionality for various applications.

Table of Contents

Synthesis of New Nanostructured Materials

Nanocrystalline Materials

Multilayers and Superlattices

Nanocomposite Films

Thin Film Processing

Principles of Plasma Discharges

Physical Sputtering and Transport of Sputtered Material

Sputter Deposition Techniques. Reactive Sputter Deposition

Film Formation and Structure

of Sputtered Material

Interface Formation

Nucleation and Growth

Microstructure of Thin Films, Structure Zone Models, Advantages and Limitations of Sputter Deposition Processes

Structure-Property Relation in Hard Films

Me-Si-N Films With a Low and Intermediate Si Content

Structure, Morphology and Phase Composition Hardness and Macrostress Oxidation Resistance Problems with Reproducibility

Novel nanocomposite films - Zr-Si-N Films with a High Si Content

Deposition Rate

Elemental Composition

Chemical Bonding and Phase Composition

Electrical and Optical Properties

Structure. Morphology

Surface Roughness

Mechanical Properties

Macrostress

Effect of Substrate Bias

Thermal Stability

Oxidation Resistance

High Si-containing W-Si-N Nanocomposite Films

Deposition Rate

Elemental Composition

Chemical Bonding and Phase Composition

Structure

Morphology

Surface Roughness

Mechanical Properties

Macrostress

Oxidation Resistance

Characterization of Thin Films.

Mechanical Properties

X-Ray Diffraction Analysis

Stress Measurement

Film Thickness Measurement

Scanning Electron Microscopy

Energy Dispersive X-Ray Spectrometry

Differential Scanning Calorimetry

Thermogravimetric Analysis

About the Editors

Rostislav Daniel is associate professor at the Department of Physical Metallurgy and Materials Testing, University of Leoben, Austria. He received his MSc in applied sciences and computer engineering, applied physics and physical engineering and PhD in applied sciences and computer engineering, plasma physics and physics of thin films at the University of West Bohemia. His main research areas are plasma physics and physics of thin films, synthesis of advanced hard nanocrystalline and nanocomposite thin films of optimized structures and physical properties, advanced structural characterization of solids, characterization of mechanical properties of thin films and bulk solids, measurements of residual stresses in thin films by optical and x-ray diffraction techniques, investigations of thermo-mechanical properties of thin films and bulk solids, study of thermal stability and oxidation resistance of thin films and bulk solids, and coating design and architecture.

Jindrich Musil is professor of applied physics at the University of West Bohemia, Plzen, Czech Republic. He received his MSc in electrical engineering at the Military Technical University, Brno, Czech Republic; PhD in physics and mathematics at Czechoslovak Academy of Sciences, Prague, Czech Republic; and DSc in physics and mathematics at Czechoslovak Academy of Sciences, Prague, Czech Republic. His main research areas are electromagnetic field, propagation of electromagnetic waves, microwave plasma discharges, plasma physics, thermonuclear fusion, lasers, plasma chemistry and physics of thin films, PVD and PACVD of thin films, high-rate pulsed reactive magnetron sputtering, and development of new technological processes and advanced systems for synthesis of novel hard and functional nanocomposite coatings.

Subject Categories

BISAC Subject Codes/Headings:
TEC021000
TECHNOLOGY & ENGINEERING / Material Science