1st Edition
Photosensitive Polyimides Fundamentals and Applications
By Takashi Yamashita
Copyright 1995
328 Pages
by
CRC Press
328 Pages
by
Routledge
Also available as eBook on:
This is the first book to provide an in-depth presentation of photosensitive polyimides for electronic and photonic applications. The authors are leading specialists in this field from Japan, Europe and the U.S. From the Preface Aromatic polyimides were developed originally as thermostable flexible polymer films for space applications. Now polyimides have found widespread use in the manufacture of... Read more
Preface
Introduction to Photopolymers and Microelectronics
Introduction
Photosensitive Polymers
Polymers for Microelectronics
References
Applications of Polyimides in Electronics
Introduction
Commercially Available Photosensitive Polyimides
Performance of Commercial Photosensitive Polyimides Applications
Outlook
References
Thermal and Mechanical Properties of Polyimides and Control of High-Order Structures
Introduction
Thermal and Mechanical Properties of Aromatic Polyimides
Control of High-Order Structures of Aromatic Polyimides
References
Electronic Configuration of Polyimides and Their Photophysical Processes
Introduction
Color of Polyimide Films
Emission of Polyimide Films
Photophysical Processes in Polyimide Model Compounds
Photochemistry of Polyimide Model Compounds
Other Related Emission Behavior of Imide Compounds and Their Analogue Photoconductivity of Polyimide Films
References
Design of Photosensitive Polyimide Precursor Systems
Introduction
Structure and Reaction of Photosensitive Polyimide Precursors
Properties of Polyimides Formed from Photosensitive Polyimide Precursors
Conclusion
References
Intrinsically Photosensitive Polyimides
Introduction
Structure and Reaction of Intrinsically Photosensitive Polyimides
Photoreactivity
Mechanism and Molecular Design for Improvement of Photosensitive Polyimides References
Photosensitive Polyimides Based on Chemical Amplification Mechanism
Introduction
Amplification Process for Photosensitive Materials
Chemical Amplification
Synthesis of Polyimides Characteristics of Protected Polyimides 6F-t-BOC and 6F-THP Lithographic Performance of Protected Polyimides
Acidolytic Deprotection Rate in Film Matrices
Photochemical Reaction of PAG in Solid Films
Properties of 6F-t-BOC and 6F-THP
References
Electron Beam Lithography of Polyimides
Introduction
Characteristics of Radiation Effects of Polyimides
Molecular Design of Electron-Beam Sensitive Polyimides
Mechanism of Electron-Beam Irradiation of Polyimides
References
Processing of Polyimides and Related Topics
Introduction
Representative Electronic Applications Deposition Methods
Patterning of Conventional Polyimides Processing of Photosensitive Polyimides
Processes for High-Density Multilevel Metallization
References
Applications of Polyimides to Photonic Devices
Introduction
Nonlinear Optical Phenomena
Organic versus Inorganic Nonlinear Optical Materials
EO Effect in Polymers and Use for Devices
Requirements for Polymers in Photonics Polyimide-Based EO Devices
NLO Chromophore Requirements for Use in EO Polymer Devices
Photosensitive Polyimides in Photonics Higher Levels of Integration: Advantages of Polymers
Summary
References
39 Tables, 208 Figures
Numerous tables and graphs provide extensive quantitative data on polyimides for electronic applications. The many schematics and micrographs illustrate materials, processes and devices. Here is a small sampling.
Tables: Patterning and thermal properties of commercially available photosensitive polyimides
Mechanical and electrical properties of commercially available photosensitive polyimides
Chemical structures of commercially available polyimide films
Required properties of photosensitive poyimides
Applications of polyimide for electronic devices
Materials requirements for EO polymer devices
Micrographs: Memory devices on a silicon wafer, the cell arrays are protected by thick polyimide patterns
Layout of a liquid crystal display with polyimide alignment layers
SEM picture of line and space pattern formed with 6F-THP
Schematics: Chemical principle and processing steps for direct production of PI-patterns
Polyimide patterning processes
High temperature post-exposure process using photosensitive polyimide precursors
Comparison of polyimide patterning processes between polyimides with and without photosensitivity
Process flow for planarization with lift-off technique
Examples of applications for polymers in photonic systems
Introduction to Photopolymers and Microelectronics
Introduction
Photosensitive Polymers
Polymers for Microelectronics
References
Applications of Polyimides in Electronics
Introduction
Commercially Available Photosensitive Polyimides
Performance of Commercial Photosensitive Polyimides Applications
Outlook
References
Thermal and Mechanical Properties of Polyimides and Control of High-Order Structures
Introduction
Thermal and Mechanical Properties of Aromatic Polyimides
Control of High-Order Structures of Aromatic Polyimides
References
Electronic Configuration of Polyimides and Their Photophysical Processes
Introduction
Color of Polyimide Films
Emission of Polyimide Films
Photophysical Processes in Polyimide Model Compounds
Photochemistry of Polyimide Model Compounds
Other Related Emission Behavior of Imide Compounds and Their Analogue Photoconductivity of Polyimide Films
References
Design of Photosensitive Polyimide Precursor Systems
Introduction
Structure and Reaction of Photosensitive Polyimide Precursors
Properties of Polyimides Formed from Photosensitive Polyimide Precursors
Conclusion
References
Intrinsically Photosensitive Polyimides
Introduction
Structure and Reaction of Intrinsically Photosensitive Polyimides
Photoreactivity
Mechanism and Molecular Design for Improvement of Photosensitive Polyimides References
Photosensitive Polyimides Based on Chemical Amplification Mechanism
Introduction
Amplification Process for Photosensitive Materials
Chemical Amplification
Synthesis of Polyimides Characteristics of Protected Polyimides 6F-t-BOC and 6F-THP Lithographic Performance of Protected Polyimides
Acidolytic Deprotection Rate in Film Matrices
Photochemical Reaction of PAG in Solid Films
Properties of 6F-t-BOC and 6F-THP
References
Electron Beam Lithography of Polyimides
Introduction
Characteristics of Radiation Effects of Polyimides
Molecular Design of Electron-Beam Sensitive Polyimides
Mechanism of Electron-Beam Irradiation of Polyimides
References
Processing of Polyimides and Related Topics
Introduction
Representative Electronic Applications Deposition Methods
Patterning of Conventional Polyimides Processing of Photosensitive Polyimides
Processes for High-Density Multilevel Metallization
References
Applications of Polyimides to Photonic Devices
Introduction
Nonlinear Optical Phenomena
Organic versus Inorganic Nonlinear Optical Materials
EO Effect in Polymers and Use for Devices
Requirements for Polymers in Photonics Polyimide-Based EO Devices
NLO Chromophore Requirements for Use in EO Polymer Devices
Photosensitive Polyimides in Photonics Higher Levels of Integration: Advantages of Polymers
Summary
References
39 Tables, 208 Figures
Numerous tables and graphs provide extensive quantitative data on polyimides for electronic applications. The many schematics and micrographs illustrate materials, processes and devices. Here is a small sampling.
Tables: Patterning and thermal properties of commercially available photosensitive polyimides
Mechanical and electrical properties of commercially available photosensitive polyimides
Chemical structures of commercially available polyimide films
Required properties of photosensitive poyimides
Applications of polyimide for electronic devices
Materials requirements for EO polymer devices
Micrographs: Memory devices on a silicon wafer, the cell arrays are protected by thick polyimide patterns
Layout of a liquid crystal display with polyimide alignment layers
SEM picture of line and space pattern formed with 6F-THP
Schematics: Chemical principle and processing steps for direct production of PI-patterns
Polyimide patterning processes
High temperature post-exposure process using photosensitive polyimide precursors
Comparison of polyimide patterning processes between polyimides with and without photosensitivity
Process flow for planarization with lift-off technique
Examples of applications for polymers in photonic systems
Biography
Yamashita, Takashi
