Run-to-Run Control in Semiconductor Manufacturing: 1st Edition (Hardback) book cover

Run-to-Run Control in Semiconductor Manufacturing

1st Edition

Edited by James Moyne, Enrique del Castillo, Arnon M. Hurwitz

CRC Press

368 pages

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Hardback: 9780849311789
pub: 2000-11-30
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Description

Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Table of Contents

Introduction

What is Run-top-Run Control?

Target Audience

Purpose of this Book

Outline

Background

Current State-of-the-Art in Semiconductor Manufacturing Process Control

History of the Development of Run-to-Run Control

Current State o-of-the-Art in Run-to-Run Control Development and Deployment

Simple Example: Run-to-Run Control and Comparison to Statistical Process Control

Identifying Target Applications for Run-to-Run Control

Class of Applications that can Utilize Run-t0-Run Control

General Run-to-Run Control Development and Deployment Process

Issues in Deploying Run-to-Run Control

Developing a Run-to-Run Solution: Run-to-Run Algorithms

Introduction

Linear Approximation Algorithms

Higher Order Approximation Algorithms

Neural Network Algorithms

Other Approaches

Developing a Run-to-Run Solution: Practical Extensions to Algorithms

Developing and Deploying Run-to-Run Solutions:

Integrating Control

Introduction

The Generic Cell Controller

Other Approaches

Integrating into Factory-Wide Manufacturing System

Run-to-Run Solution Development, Deployment, and Customization Methodology

Introduction

Process Identification

Choosing a Run-to-Run Control Solution

Customizing the Run-to-Run Control Solution to the Process

Issues

Run-to-Run Control System Deployment Case Studies

Chemical-Mechanical Planarization

Vapor Phase Epitaxy

Advanced Topics

Feasibility Analysis of Run-to-Run Control Solutions

Stability Analysis of Run-to-Run Control Solutions

Combining Process Run-to-Run Control with Inter-Process Control

Conclusions

Summary of Run-to-Run Development and Deployment Process

Deploying Run-to-Run Control in a Timely and Cost Effective Manner

Overcoming Barriers to Deployment

Future Research and Development Issues

References

Subject Categories

BISAC Subject Codes/Headings:
TEC007000
TECHNOLOGY & ENGINEERING / Electrical
TEC008000
TECHNOLOGY & ENGINEERING / Electronics / General
TEC020000
TECHNOLOGY & ENGINEERING / Manufacturing