ISBN 9781315897523
306 Pages
Published
December 14, 2017
by
CRC Press
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ISBN 9781351076623
306 Pages
Published
May 4, 2018
by
CRC Press
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This book focuses on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. It discusses the obstacles any new technology must overcome to be commercially successful with specific references to the challenges confronting Silicon-Molecular Beam Epitaxy.
9. Principles of Heteroepitaxy 10. Epitaxial Silicides 11. Silicon-Based Semiconductor Heterostructures 12. Assessment of Layers 13. Industrial Application: Perspective and Requirements 14. Industrial Application: Possible Approaches 15. Molecular Beam Epitaxy of Silicon Materials: A Bibliography 1962 - 1985
Biography
Kasper, E.
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