138 pages | 39 Color Illus. | 49 B/W Illus.
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
About the Authors
Chapter 1 ◾ Introduction to Nanoelectronics
Chapter 2 ◾ Tri-Gate FinFET Technology and Its Advancement
Chapter 3 ◾ Dual-k Spacer Device Architecture and Its Electrostatics
Chapter 4 ◾ Capacitive Analysis and Dual-k FinFET-Based Digital Circuit Design
Chapter 5 ◾ Design Metric Improvement of a Dual-k–Based SRAM Cell
Chapter 6 ◾ Statistical Variability and Sensitivity Analysis