This volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning, held in Newark, New Jersey, May 23-25, 2001. Because of the importance of this topic in many technological areas, tremendous efforts have been devoted to devise novel and more efficient ways to monitor, analyse and characterize contamination on surfaces as well as ways to remove such contamination from a wide variety of surfaces. The technological areas where surface contamination has always been a bete noire and thus surface cleaning is of cardinal importance are too many and range from aerospace to microelectronics to biomedical. This volume contains a total of 24 papers, all rigorously peer reviewed and revised before inclusion, which deal with all kinds of contaminations on a host of surfaces. The topics covered include: mapping of surface contaminants; various techniques for cleaning surfaces; various techniques for monitoring level of cleanliness; acceptable cleanliness levels; ionic contamination; pharmaceutical cleaning validations; cleaning of glass surfaces; decontamination of sensitive equipment; no-chemistry process cleaning; waterjet cleaning; cleaning with solid carbon dioxide pellet blasting; cleanroom wipers; dust removal from solar panels and spacecraft on Mars; laser cleaning of silicon surfaces; particle removal; implications of surface contamination and cleaning; and future of industrial cleaning and related public policy-making.
Preface Mapping of surface contaminants by tunable infrared-laser imaging D. Ottesen, S. Sickafoose, H. Johnsen, T. Kulp, K. Armstrong, S. Allendorf and T. Hoffard Monitoring cleanliness and defining acceptable cleanliness levels M.K. Chawla Tracking surface ionic contamination by ion chromatography B. Newton A new method using MESERAN technique for measuring surface contamination after solvent extraction M.G. Benkovich and J.L. Anderson Methods for pharmaceutical cleaning validations H.J. Kaiser Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination W. Birch, S. Mechken and A. CarrÃ© Decontamination of sensitive equipment R. Kaiser and K. Haraldsen The fundamentals of no-chemistry process cleaning J.B. Durkee II Development of a technology for generation of ice particles D.V. Shishkin, E.S. Geskin and B. Goldenberg Cleaning with solid carbon dioxide pellet blasting F.C. Young Development of a generic procedure for modeling of waterjet cleaning K. Babets and E.S. Geskin Experimental and numerical investigation of waterjet derusting technology K. Babets, E.S. Geskin and B. Goldenberg Practical applications of icejet technology in surface processing D.V. Shishkin, E.S. Geskin and B. Goldenberg Correlating cleanliness to electrical performance T. Munson Qualifying a cleaning system for space flight printed wiring assemblies J.K. â€œKirkâ€ Bonner and A. Mehta Investigation of modified SC-1 solutions for silicon wafer cleaning C. Beaudry and S. Verhaverbeke Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environment M.T. Andreas Spatial and temporal scales in wet processing of deep submicrometer features M. Olim Microdenier fabrics for cleanroom wipers J. Skoufis and D.W. Cooper Fine particle detachment studied by reflectometry and atomic force microscopy Feiler and J. Ralston Dust removal from solar panels and spacecraft on Mars S. Trigwell, M.K. Mazumder, A.S. Biris, S. Anderson and C.U. Yurteri Laser cleaning of silicon wafers: Prospects and problems M. Mosbacher, V. Dobler, M. Bertsch, H.-J. MÃ¼nzer, J. Boneberg and P. Leiderer Particle removal using resonant laser detachment K. Kearney and P. Hammond The future of industrial cleaning and related public policy-making C. LeBlanc