364 Pages
by
CRC Press
364 Pages
by
CRC Press
Also available as eBook on:
This volume documents the proceedings of the International Symposium on Surface Contamination and Cleaning , held in Newark, New Jersey, May 23-25, 2001.
Because of the importance of this topic in many technological areas, tremendous efforts have been devoted to devise novel and more efficient ways to monitor, analyse and characterize contamination on surfaces as well as ways to remove such... Read more
Preface
Mapping of surface contaminants by tunable infrared-laser imaging
D. Ottesen, S. Sickafoose, H. Johnsen, T. Kulp, K. Armstrong, S. Allendorf and T. Hoffard
Monitoring cleanliness and defining acceptable cleanliness levels
M.K. Chawla
Tracking surface ionic contamination by ion chromatography
B. Newton
A new method using MESERAN technique for measuring surface contamination after solvent extraction
M.G. Benkovich and J.L. Anderson
Methods for pharmaceutical cleaning validations
H.J. Kaiser
Influence of cleaning on the surface of model glasses and their sensitivity to organic contamination
W. Birch, S. Mechken and A. Carré
Decontamination of sensitive equipment
R. Kaiser and K. Haraldsen
The fundamentals of no-chemistry process cleaning
J.B. Durkee II
Development of a technology for generation of ice particles
D.V. Shishkin, E.S. Geskin and B. Goldenberg
Cleaning with solid carbon dioxide pellet blasting
F.C. Young
Development of a generic procedure for modeling of waterjet cleaning
K. Babets and E.S. Geskin
Experimental and numerical investigation of waterjet derusting technology
K. Babets, E.S. Geskin and B. Goldenberg
Practical applications of icejet technology in surface processing
D.V. Shishkin, E.S. Geskin and B. Goldenberg
Correlating cleanliness to electrical performance
T. Munson
Qualifying a cleaning system for space flight printed wiring assemblies
J.K. “Kirk†Bonner and A. Mehta
Investigation of modified SC-1 solutions for silicon wafer cleaning
C. Beaudry and S. Verhaverbeke
Performance qualification of post-CMP cleaning equipment in a semiconductor fabrication environment
M.T. Andreas
Spatial and temporal scales in wet processing of deep submicrometer features
M. Olim
Microdenier fabrics for cleanroom wipers
J. Skoufis and D.W. Cooper
Fine particle detachment studied by reflectometry and atomic force microscopy
Feiler and J. Ralston
Dust removal from solar panels and spacecraft on Mars
S. Trigwell, M.K. Mazumder, A.S. Biris, S. Anderson and C.U. Yurteri
Laser cleaning of silicon wafers: Prospects and problems
M. Mosbacher, V. Dobler, M. Bertsch, H.-J. Münzer, J. Boneberg and P. Leiderer
Particle removal using resonant laser detachment
K. Kearney and P. Hammond
The future of industrial cleaning and related public policy-making
C. LeBlanc
Biography
Kash L. Mittal
