1st Edition
Tribology In Chemical-Mechanical Planarization
200 Pages
by
CRC Press
200 Pages
by
CRC Press
200 Pages
by
CRC Press
Also available as eBook on:
The role that friction and contact play in the processes of wear and planarization on material surfaces is central to the understanding of Chemical-Mechanical planarization (CMP) technology, particularly when applied to nanosurfaces. Tribology in Chemical-Mechanical Planarization presents a detailed account of the CMP process in a language that is suitable for tribology professionals as well as... Read more
Introduction, Surface Properties, Friction, Lubrication, Wear In CMP, Force Transmission, CMP Pads, Post-CMP Cleaning
Biography
Liang, Hong; Craven, David
