This volume presents a complete and thorough examination of advances in the instrumentation, evaluation, and implementation of UV technology for reliable and efficient data acquisition and analysis. It provides real-world applications in expanding fields such as chemical physics, plasma science, photolithography, laser spectroscopy, astronomy and atmospheric science.
UV spectroscopy in chemical physics, combustion, plasma science, and photolithography: ultraviolet and vacuum ultraviolet source and materials for lithography
Laser optogalvanic spectroscopy for discharge plasmas in the ultraviolet region
Spectra of the isotopomers of CO, N2, and NO in the ultraviolet
Photoabsorpton cross section measurements in the UV and VUV
UV and VUV laser spectroscopy using florescence
Time-of-flight mass detection
VUV spectroscopy of diatomic and triatomic molecules and VUV optical photolithography
Spectroscopy associated with the search for new UV and VUV solid-state materials for laser technology: tunable solid-state UV and VUV lasers
VUV laser spectroscopy of trivalent rare earth ions in wide band-gap fluoride crystals
Spectroscopy of broadband UV emitting materials based on trivalent rare earth ions
Solid-state tunable lasers for UV applications: generation of coherent ultraviolet and vacuum ultraviolet radiation by nonlinear processes in intense optical fields
All-solid-state, short-pulse, tunable, ultraviolet laser sources based on Ce3-activated by fluoride crystals
Diode-pumped picosecond UV lasers by nonlinear frequency conversions
UV spectroscopy in atmospheric science and astronomy: atmospheric ultraviolet spectroscopy
Ultraviolet spectroscopy in astronomy.