Handbook of Photomask Manufacturing Technology: 1st Edition (Hardback) book cover

Handbook of Photomask Manufacturing Technology

1st Edition

Edited by Syed Rizvi

CRC Press

728 pages | 384 B/W Illus.

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Hardback: 9780824753740
pub: 2005-04-07
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Description

As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available.

The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation.

Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.

Reviews

". . . a stellar addition to this field . . . a must-have for every mask maker’s library . . . there is too much in this book that is absolutely fantastic."

– Dan Hutcheson, in Paper Details, March 2007

Table of Contents

Foreword by Yoshio Nishi

Preface, Syed Rizvi

INTRODUCTION

Introduction to Mask Making

A.G. Zanzal

MASK WRITING

Data Preparation

P.J.M. van Adrichem and C.K. Kalus

Mask Writers: An Overview

S. Babin

E-Beam Mask Writers

N. Saitou

Laser Mask Writers

C. Rydberg

OPTICAL MASKS

Optical masks: An Overview

N. Yoshioka

Conventional Optical Masks

S.A. Rizvi

Advanced Optical Masks

W. Maurer and F. Schellenberg

NGL MASKS

NGL Masks: An Overview

K.R. Kimmel and M. Lercel

Masks for Electron Beam Projection Lithography

H. Sano, S. Palmer, and M. Yamabe

Masks for Extreme Ultraviolet Lithography

P-Y. Yan

Masks for Ion Projection Lithography

S.A. Rizvi, F-M. Kamm, J. Butschke, F. Letzkus, and H. Loeschner

Mask for Proximity X-Ray Lithography

M. Oda and H. Yoshihara

MASK PROCESSING, MATERIALS, AND PELLICLES

Mask Substrate

S.A. Rizvi

Resists for Mask Making

B. Rathsack, D. Medeiros, and C.G. Wilson

Resist Charging and Heating

M. Bai, D. Chu, and F. Pease

Mask Processing

S.A. Rizvi

Mask Materials: Optical Properties

V. Liberman

Pellicles

T. Yen, C.B. Wang, and R. Heuser

MASK METROLOGY, INSPECTION, EVALUATION, AND REPAIRS

Photomask Feature Metrology

J. Potzick

Optical Critical Dimension Metrology

R.J. Hoobler

Photomask Critical Dimension Metrology in the Scanning Electron Microscope

M.T. Postek

Geometrical Characterization of Mask Using SPM

S. Muckenhirn and A. Meyyappan

Metrology of Image Placement

M.T. Takac

Optical Thin Film Metrology for Photomask Applications

E. Apak

Phase Measurement Tool for PSM

H. Kusunose

Mask Inspection: Theories and Principle

A. Rosenbusch and S. Hemar

Tool for Inspecting Masks: Lasertec MD 2500

M. Yonezawa and T. Matsuyama

Tool for Mask Image Evaluation

A. Zibold

Mask Repairs

R. Lee

MODELING AND SIMULATION

Modeling and Simulation

A. Erdmann

INDEX

Subject Categories

BISAC Subject Codes/Headings:
TEC008000
TECHNOLOGY & ENGINEERING / Electronics / General
TEC019000
TECHNOLOGY & ENGINEERING / Lasers & Photonics
TEC027000
TECHNOLOGY & ENGINEERING / Nanotechnology & MEMS