Jenny Stanford Publishing
412 pages | 10 Color Illus. | 183 B/W Illus.
This book contains comprehensive reviews of different technologies to harness lattice mismatch in semiconductor heterostructures and their applications in electronic and optoelectronic devices. While the book is a bit focused on metamorphic epitaxial growth, it also includes other methods like compliant substrate, selective area growth, wafer bonding, heterostructure nanowires, and more. Basic knowledge on dislocations in semiconductors and innovative methods to eliminate threading dislocations are provided, and successful device applications are reviewed. It covers a variety of important semiconductor materials like SiGe, III-V including GaN and nano-wires; epitaxial methods like molecular beam epitaxy and metal organic vapor phase epitaxy; and devices like transistors and lasers etc.
Dislocation reduction by interfacial misfit method
selective area growth
low temperature direct wafer bonding
heterostructures and strain relaxation in semiconductor nanowires
epitaxial growth of nitrides
metamorphic HEMT technology
metamorphic quantum dot lasers
metamorphic quantum well lasers
nitride based LEDs and laser diodes