Nanofabrication by Ion-Beam Sputtering: Fundamentals and Applications, 1st Edition (Hardback) book cover

Nanofabrication by Ion-Beam Sputtering

Fundamentals and Applications, 1st Edition

Edited by Tapobrata Som, Dinakar Kanjilal

Jenny Stanford Publishing

356 pages | 28 Color Illus. | 124 B/W Illus.

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pub: 2012-11-27
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Description

Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attractive. This book reviews various fascinating results, understand the underlying physics of ion induced pattern formation, to highlight the potential applications of the patterned surfaces, and to explore the patterning behavior by different irradiation parameters in order to create desired surface morphologies on specific materials.

Reviews

"This volume provides a remarkable overview of the status of the evolving field of ion-beam sputtering and its promising applications as a process tool for tailoring self-organized patterned properties and periodic nanoscale topographic features of surfaces. The topical scope includes the fundamental physics of sputtering, advanced simulations of pattern formation, and selected experimental applications. The list of authors includes distinguished authorities in this field, and the book will surely become a highly cited reference source, as future manufacturing technologies develop."

—Dr. J. E. E. Baglin - IBM Almaden Research Center, USA

"Since the inception of nanotechnology in the 1970s, low-energy ion-beam sputtering of solids has been expected to rank among the top routes to nanostructures fabrication. In spite of the development that this technique has since undergone, to date a thorough revision is under way on the basic mechanisms controlling the pattern formation process, key to a full control of its practical implications. This book provides a broad and timely view of the topic through contributions by world-class specialists, from atomistic principles and discrete theoretical modeling to experiments and technological applications. It will be invaluable for both practitioners in the field and anyone interested in nanoscience, to assess the degree to which current developments enable the harnessing of the technique that is up to the well-founded expectations."

—Prof. Rodolfo Cuerno - Universidad Carlos III de Madrid, Spain

"Bombarding a solid surface with a broad ion beam can produce a remarkable variety of self-assembled nanoscale patterns, including periodic height modulations or "ripples" and mounds arranged in hexagonal arrays of astonishing regularity. This book gives a comprehensive overview of our current understanding of these intriguing phenomena. Written by leaders in the field, it covers both theoretical and experimental work, and the topics range from the fundamental to the applied. This volume will be an invaluable reference for both researchers in the field and those who are new to the topic."

—Prof. R. Mark Bradley - Colorado State University, USA

Table of Contents

Elements of Sputtering Theory, Peter Sigmund

Introduction

General aspects

High-energy cascade dynamics

Input

Low-energy dynamics

Concluding remarks

Sputter-Ripple Formation on Flat and Rough Surfaces – A Case Study with Si, S.A. Mollick and D. Ghose

Introduction

Mechanisms of pattern formation

Sample preparation and analysis

Results and discussion

Conclusions

Low Energy Ion Induced Pattern Formation in Si-Ge Alloy, Subhendu Sarkar

Introduction

Theoretical aspects

Patterning of alloy surfaces

Studies on SiGe surfaces

Ion beam effects

Conclusion and outlook

Patterning of Ionic Insulator Surfaces with Low Energy Ion Beams, Franciszek Krok, Salah R. Saeed, Marek Kolmer, and Marek Szymonski

Introduction

Remarks on experimental details

Surface morphology changes at the initial stages of ion bombardment

Ripple formation for prolonged irradiation with off normal incidence ion beam

Temperature dependent patterning of ionic single crystal surfaces

Electronic versus ballistic processes on ion irradiated ionic surfaces

Concluding remarks

Nanostructures of Thin Films by keV Ion Beams, Prasanta Karmakar

Introduction

Variation of surface patterns

Origin of ion induced nanostructure formation

Dependence on local ion impact angle

Spatially resolved magnetic and electric zone formation

Coulomb explosion sputtering of spatially oxidized nanostructures

Summary

Surface Nanopatterns on Si(100) by Normal-Incidence Ion Sputtering with Metal Incorporation, Raúl Gago, José A. Sánchez-García, Andrés Redondo-Cubero, and Luis Vázquez

Introduction

Experiment

Nanopattern formation with a cold-cathode ion source

Role of metal incorporation on the pattern selectivity

On the mechanism of pattern selectivity and outlook

Conclusions

Kinetic Monte Carlo Simulations of Low Energy Ion-Induced Surface Patterning, Wai-Lun Chan and Eric Chason

Introduction

KMC model

Ripples formation in the linear instability regime

Dependence of ripple wavelength on temperature and ion flux

Barrier for ripples formation in the low flux and high temperature regime

Effect of multiple defects

Conclusions

From Cascades to Patterns: A Monte Carlo Approach, Reiner Kree and Taha Yasseri

Introduction

Lessons from BCA and Kinetic Theory

Basic Monte Carlo model

Variants and refinements

Conclusions

Understanding Surface Patterning By Lattice Gas Models, Géza Ódor, Bertosz Liedke, and Karl-Heinz Heinig

Introduction

Mapping of surface adsorption or desorption onto lattice gases

Numerical simulation for Kardar-Parisi-Zhang (KPZ)

The surface diffusion model in 2D

Pattern generation by competing inverse MH and KPZ processes

KPZ in the presence of normal surface diffusion

Conclusion and outlook

Applications of Ion Induced Patterned Substrates in Plasmonics, Mukesh Ranjan, Thomas W. H. Oates, and Stefan Facsko

Introduction: Demand of plasmonics

Scaling laws to produce ripple templates for plasmonic application

Metal film growth on rippled templates by PVD methods

Plasmonic properties

Conclusions

Subject Categories

BISAC Subject Codes/Headings:
SCI055000
SCIENCE / Physics
TEC021000
TECHNOLOGY & ENGINEERING / Material Science