1st Edition

Nanofabrication by Ion-Beam Sputtering
Fundamentals and Applications




ISBN 9789814303750
Published November 27, 2012 by Jenny Stanford Publishing
356 Pages 28 Color & 124 B/W Illustrations

USD $160.00

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Book Description

Considerable attention has been paid to ion beam sputtering as an effective way to fabricate self-organized nano-patterns on various substrates. The significance of this method for patterning surfaces is that the technique is fast, simple, and less expensive. The possibility to create patterns on very large areas at once makes it even more attractive. This book reviews various fascinating results, understand the underlying physics of ion induced pattern formation, to highlight the potential applications of the patterned surfaces, and to explore the patterning behavior by different irradiation parameters in order to create desired surface morphologies on specific materials.

Table of Contents

Elements of Sputtering Theory, Peter Sigmund
Introduction
General aspects
High-energy cascade dynamics
Input
Low-energy dynamics
Concluding remarks

Sputter-Ripple Formation on Flat and Rough Surfaces – A Case Study with Si, S.A. Mollick and D. Ghose
Introduction
Mechanisms of pattern formation
Sample preparation and analysis
Results and discussion
Conclusions

Low Energy Ion Induced Pattern Formation in Si-Ge Alloy, Subhendu Sarkar
Introduction
Theoretical aspects
Patterning of alloy surfaces
Studies on SiGe surfaces
Ion beam effects
Conclusion and outlook

Patterning of Ionic Insulator Surfaces with Low Energy Ion Beams, Franciszek Krok, Salah R. Saeed, Marek Kolmer, and Marek Szymonski
Introduction
Remarks on experimental details
Surface morphology changes at the initial stages of ion bombardment
Ripple formation for prolonged irradiation with off normal incidence ion beam
Temperature dependent patterning of ionic single crystal surfaces
Electronic versus ballistic processes on ion irradiated ionic surfaces
Concluding remarks

Nanostructures of Thin Films by keV Ion Beams, Prasanta Karmakar
Introduction
Variation of surface patterns
Origin of ion induced nanostructure formation
Dependence on local ion impact angle
Spatially resolved magnetic and electric zone formation
Coulomb explosion sputtering of spatially oxidized nanostructures
Summary

Surface Nanopatterns on Si(100) by Normal-Incidence Ion Sputtering with Metal Incorporation, Raúl Gago, José A. Sánchez-García, Andrés Redondo-Cubero, and Luis Vázquez
Introduction
Experiment
Nanopattern formation with a cold-cathode ion source
Role of metal incorporation on the pattern selectivity
On the mechanism of pattern selectivity and outlook
Conclusions

Kinetic Monte Carlo Simulations of Low Energy Ion-Induced Surface Patterning, Wai-Lun Chan and Eric Chason
Introduction
KMC model
Ripples formation in the linear instability regime
Dependence of ripple wavelength on temperature and ion flux
Barrier for ripples formation in the low flux and high temperature regime
Effect of multiple defects
Conclusions

From Cascades to Patterns: A Monte Carlo Approach, Reiner Kree and Taha Yasseri
Introduction
Lessons from BCA and Kinetic Theory
Basic Monte Carlo model
Variants and refinements
Conclusions

Understanding Surface Patterning By Lattice Gas Models, Géza Ódor, Bertosz Liedke, and Karl-Heinz Heinig
Introduction
Mapping of surface adsorption or desorption onto lattice gases
Numerical simulation for Kardar-Parisi-Zhang (KPZ)
The surface diffusion model in 2D
Pattern generation by competing inverse MH and KPZ processes
KPZ in the presence of normal surface diffusion
Conclusion and outlook

Applications of Ion Induced Patterned Substrates in Plasmonics, Mukesh Ranjan, Thomas W. H. Oates, and Stefan Facsko
Introduction: Demand of plasmonics
Scaling laws to produce ripple templates for plasmonic application
Metal film growth on rippled templates by PVD methods
Plasmonic properties
Conclusions

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Reviews

"This volume provides a remarkable overview of the status of the evolving field of ion-beam sputtering and its promising applications as a process tool for tailoring self-organized patterned properties and periodic nanoscale topographic features of surfaces. The topical scope includes the fundamental physics of sputtering, advanced simulations of pattern formation, and selected experimental applications. The list of authors includes distinguished authorities in this field, and the book will surely become a highly cited reference source, as future manufacturing technologies develop."
—Dr. J. E. E. Baglin - IBM Almaden Research Center, USA

"Since the inception of nanotechnology in the 1970s, low-energy ion-beam sputtering of solids has been expected to rank among the top routes to nanostructures fabrication. In spite of the development that this technique has since undergone, to date a thorough revision is under way on the basic mechanisms controlling the pattern formation process, key to a full control of its practical implications. This book provides a broad and timely view of the topic through contributions by world-class specialists, from atomistic principles and discrete theoretical modeling to experiments and technological applications. It will be invaluable for both practitioners in the field and anyone interested in nanoscience, to assess the degree to which current developments enable the harnessing of the technique that is up to the well-founded expectations."
—Prof. Rodolfo Cuerno - Universidad Carlos III de Madrid, Spain

"Bombarding a solid surface with a broad ion beam can produce a remarkable variety of self-assembled nanoscale patterns, including periodic height modulations or "ripples" and mounds arranged in hexagonal arrays of astonishing regularity. This book gives a comprehensive overview of our current understanding of these intriguing phenomena. Written by leaders in the field, it covers both theoretical and experimental work, and the topics range from the fundamental to the applied. This volume will be an invaluable reference for both researchers in the field and those who are new to the topic."
—Prof. R. Mark Bradley - Colorado State University, USA