1st Edition
Photopolymers Photoresist Materials, Processes, and Applications
Introduction
About the Author
Basic Idea of Photopolymerization
Introduction
Radical Polymerization
Monomers for Photopolymerization
Initiators of Photopolymerization
Inhibition of Polymerization
Cationic Photopolymerization
Photocrosslinking
Scission of Polymers
References
Chemically Amplified Resists
Introduction
Chemical Amplification of Photopolymers
Polymers for Chemical Amplification
Photoacid Generator
References
Process of Chemically Amplified Resists
Introduction
Progress of Resolution Limit
Immersion Lithography
Double Patterning
EUV Lithography
Direct Self-Assembly (DSA)
References
Nanoimprinting
Introduction
Thermal Nanoimprinting
UV Nanoimprinting
Cationic Polymerization of UV Nanoimprinting
Ene-Thiol Polymerization of UV Nanoimprinting
Soft Lithography
References
Industrial Applications of Photopolymers
Introduction
Application to Electronics
Optical Adhesive Polymers
Holographic Photopolymers
Application to Medical Materials
Microelectromechanical Systems (MEMS)
References
Biography
Kenichiro Nakamura graduated from Kanazawa University, Japan in 1963 and from the University of Tokyo, Japan in 1968 with his doctorate in engineering. He conducted his postdoctoral fellowship at the University of Texas at Austin, USA in 1968–1970. His experience also includes working for Prof. Albert Noyes in photochemistry; holding the positions of associate professor (1970–1978), professor (1978–2010), and honorary professor (2010–present) at Tokai University, Japan; and serving as editor-in-chief of the Journal of Photopolymer Science and Technology (1998–present). In addition to books, his work has been published in many prestigious journals.
"... a toolbox for individuals needing practical knowledge in the area of photopolymers and photoresist materials. It contains practical guidance in chemistry, fabrication, and industrial reduction-to-practice of photopolymer technology. The volume is comprised of five chapters. A major theme of the book is the relationship between photopolymer technology and the increasing miniaturization of electronic and mechanical devices. ... This short book has enough material to give a novice a good start in the field of photopolymer technology. It is written at a level appropriate for individuals with a chemistry or polymer engineering background."
—Thomas M. Cooper, Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio, USA, from MRS Bulletin, April 2015"... fit for a chemist who wants to learn the physical principles of optical lithographic techniques."
—Dejan Pantelić, Institute of Physics, Belgrade, Serbia, from Optics & Photonics News, April 2015
