As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing presents new developments and technologies for producing the next generation of electronic circuits and displays.
This book introduces radical-reaction-based semiconductor manufacturing technologies that overcome the limitations of the existing molecule-reaction-based technologies. It systematically details the procedures and underlying concepts involved in wet process technologies and applications. Following an introduction to semiconductor surface chemical electronics, expert contributors discuss the principles and technology of high-performance wet cleaning; etching technologies and processes; antistatic technology; wet vapor resist stripping technology; and process and safety technologies including waste reclamation, chemical composition control, and ultrapure water and liquid chemical supply systems and materials for fluctuation-free facilities.
Currently, large production runs are needed to balance the costs of acquiring and tuning equipment for specialized operating conditions. Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing explains the technologies and processes used to meet the demand for variety and low volumes that exists in today's digital electronics marketplace.
Table of Contents
Surface Chemical Electronics at the Semiconductor Surface; Tadahiro Ohmi
Principles of Semiconductor Device Wet Cleaning; Hitoshi Morinaga
High-Performance Wet-Cleaning Technology; Hiroshi Morita, Akinobu Teramoto, Senri Ojima, and Kerichi Mitshumori
Etching of Various SiO2; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, Jun Takano, and Akinobu Taramoto
Silicon Etching; Kenichi Mitsumori and Nobuhiko Inoue
Chemical Composition Control Technology; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, and Jun Takano
Wet Vapor Resist Stripping Technology; Senri Ojima and Tadahiro Ohmi
Antistatic Technology; Kenichi Mitsumori and Takashi Imaoka
Chemical Waste Reclamation Technology; Hiroshi Sugawara and Takashi Imaoka
Ultrapure Water and Gas-Dissolved Water Supply System for Fluctuation-Free Facility; Ikunori Yokoi, Masaaki Nagase, Koji Nishino, Nobukazu Ikeda, Masafumi Kitano, Hiroto Izumi, and Tadahiro Ohmi