1st Edition
Scientific Wet Process Technology for Innovative LSI/FPD Manufacturing
Edited By Tadahiro Ohmi
Copyright 2005
400 Pages
465 B/W Illustrations
by
CRC Press
400 Pages
465 B/W Illustrations
by
CRC Press
Also available as eBook on:
As science pushes closer toward the atomic size scale, new challenges arise to slow the pace of the miniaturization that has transformed our society and fueled the information age. New technologies are necessary to surpass these obstacles and realize the tremendous growth predicted by Moore's law. Assembled from the works of pioneering researchers, Scientific Wet Process Technology for Innovative... Read more
Surface Chemical Electronics at the Semiconductor Surface; Tadahiro Ohmi
Principles of Semiconductor Device Wet Cleaning; Hitoshi Morinaga
High-Performance Wet-Cleaning Technology; Hiroshi Morita, Akinobu Teramoto, Senri Ojima, and Kerichi Mitshumori
Etching of Various SiO2; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, Jun Takano, and Akinobu Taramoto
Silicon Etching; Kenichi Mitsumori and Nobuhiko Inoue
Chemical Composition Control Technology; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, and Jun Takano
Wet Vapor Resist Stripping Technology; Senri Ojima and Tadahiro Ohmi
Antistatic Technology; Kenichi Mitsumori and Takashi Imaoka
Chemical Waste Reclamation Technology; Hiroshi Sugawara and Takashi Imaoka
Ultrapure Water and Gas-Dissolved Water Supply System for Fluctuation-Free Facility; Ikunori Yokoi, Masaaki Nagase, Koji Nishino, Nobukazu Ikeda, Masafumi Kitano, Hiroto Izumi, and Tadahiro Ohmi
Principles of Semiconductor Device Wet Cleaning; Hitoshi Morinaga
High-Performance Wet-Cleaning Technology; Hiroshi Morita, Akinobu Teramoto, Senri Ojima, and Kerichi Mitshumori
Etching of Various SiO2; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, Jun Takano, and Akinobu Taramoto
Silicon Etching; Kenichi Mitsumori and Nobuhiko Inoue
Chemical Composition Control Technology; Tatsuhiro Yabune, Masayuki Miyashita, Hirohisa Kikuyama, and Jun Takano
Wet Vapor Resist Stripping Technology; Senri Ojima and Tadahiro Ohmi
Antistatic Technology; Kenichi Mitsumori and Takashi Imaoka
Chemical Waste Reclamation Technology; Hiroshi Sugawara and Takashi Imaoka
Ultrapure Water and Gas-Dissolved Water Supply System for Fluctuation-Free Facility; Ikunori Yokoi, Masaaki Nagase, Koji Nishino, Nobukazu Ikeda, Masafumi Kitano, Hiroto Izumi, and Tadahiro Ohmi
Biography
Tadahiro Ohmi
